Europium-terbium-codoped rare earth silicate luminescent material, and preparation method and application thereof
A rare earth silicate, luminescent material technology, applied in luminescent materials, chemical instruments and methods, semiconductor devices, etc.
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[0034] The preparation method of the above-mentioned europium-terbium co-doped rare earth silicate luminescent material comprises the following steps:
[0035] Step S11, according to La a Gd b Lu c SiO 5 :xEu 2+ ,yTb 3+ The stoichiometric ratio of each element is taken as La 2 o 3 , Gd 2 o 3 , Lu 2 o 3 , SiO, Eu 2 o 3 and Tb 4 o 7 Powder, where x is 0.01~0.05, y is 0.005~0.03, a is 0~2, b is 0~2, c is 0~2, and a+b+c=2.
[0036] In this step, preferably, x is 0.03, y is 0.01, a is 0.3, b is 0.5, and c is 1.2.
[0037] Step S12, sintering the uniformly mixed powder at 900°C-1300°C for 0.5-5 hours to obtain a luminescent material of europium-terbium co-doped rare earth silicate, whose chemical formula is La a Gd b Lu c SiO 5 :xEu 2+ ,yTb 3+ , where La a Gd b Lu c SiO 5 is the matrix, europium ions and terbium ions are active elements, x is 0.01~0.05, y is 0.005~0.03, a is 0~2, b is 0~2, c is 0~2, and a+b+c=2 .
[0038] In this step, it is preferable to ...
Embodiment 1
[0069] Select the powder with a purity of 99.99%, and mix 0.3mmol of La 2 o 3 , 0.5 mmol of Gd 2 o 3 , 1.2 mmol of Lu 2 o 3 , 2mmol of SiO, 0.03mol of Eu 2 o 3 and 0.005 mmol Tb 4 o 7 The powder, after uniform mixing, is sintered at 1250°C to form a ceramic target with a diameter of 50mm and a thickness of 2mm, and the target is loaded into a vacuum cavity. Then, the glass substrate with ITO was ultrasonically cleaned with acetone, absolute ethanol and deionized water successively, treated with oxygen plasma, and placed in a vacuum chamber. The distance between the target and the substrate is set to 60mm. Use a mechanical pump and a molecular pump to pump the vacuum of the cavity to 5.0×10 -4 Pa, the working gas flow rate of argon is 25 sccm, the pressure is adjusted to 2.0 Pa, and the substrate temperature is 500°C. The obtained sample was annealed in a 0.01Pa vacuum furnace for 2h at an annealing temperature of 600°C, and the chemical formula was La 0.3 Gd 0.5 L...
Embodiment 2
[0075] Select the powder with a purity of 99.99%, mix 1mmol of Gd 2 o 3 , 1 mmol of Lu 2 o 3 , 2mmol of SiO, 0.005mmol of Eu 2 o 3 and 0.0025 mmol Tb 4 o 7 The powder, after uniform mixing, is sintered at 900°C to form a ceramic target with a diameter of 50 mm and a thickness of 2 mm, and the target is loaded into a vacuum chamber. Then, the glass substrate with ITO was ultrasonically cleaned with acetone, absolute ethanol and deionized water successively, treated with oxygen plasma, and placed in a vacuum chamber. The distance between the target and the substrate was set to 45mm. Use a mechanical pump and a molecular pump to evacuate the vacuum of the chamber to 1.0×10 -3 Pa, the working gas flow rate of argon is 10 sccm, the pressure is adjusted to 0.2 Pa, and the substrate temperature is 250°C. The obtained samples were annealed in a 0.01 Pa vacuum furnace for 1 h at an annealing temperature of 500 °C. The chemical formula is GdLuSiO 5 : 0.01Eu 2+ ,0.005Tb 3+ l...
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