Pattern forming apparatus and pattern forming method

A pattern and axis direction technology, applied in the field of pattern forming device and pattern formation, can solve the problems of large position deviation and inability to perform alignment on one end side, etc., and achieve the effect of small position deviation

Active Publication Date: 2014-08-06
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, it is easy to cause a positional shift in the process of bringing the two closer together and pressing from this state.
In addition, alignment can be performed on one end side where the substrate and plate are close, but not on the other end side. In addition, in the process of pressing sequentially from one end, the positional deviation may gradually increase.

Method used

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  • Pattern forming apparatus and pattern forming method
  • Pattern forming apparatus and pattern forming method
  • Pattern forming apparatus and pattern forming method

Examples

Experimental program
Comparison scheme
Effect test

no. 1 approach

[0065] figure 1 It is a perspective view which shows 1st Embodiment of the pattern forming apparatus of this invention. in addition, figure 2 is a block diagram showing a control system of the pattern forming apparatus. In addition, in figure 1 In , the state in which the external cover is removed is shown in order to show the internal structure of the device. In order to unify the direction in each figure, such as figure 1 Set the XYZ orthogonal coordinate axes as shown on the lower right. Here, the XY plane represents a horizontal plane, and the Z axis represents a vertical axis. More specifically, the +Z direction indicates a vertically upward direction. The front surface direction when viewed from the device is the -Y direction, and operations to access the device from the outside, including loading and unloading items, are performed along the Y-axis direction.

[0066] The pattern forming apparatus 1 is configured such that an upper stage unit 4 and a lower stage ...

no. 2 approach

[0159] Next, a second embodiment of the pattern forming apparatus of the present invention will be described. The pattern forming apparatus of the second embodiment is different from the pattern forming apparatus 1 of the above-mentioned first embodiment only in a part of the structure of the loading and unloading stage portion. On the other hand, other structures in the first embodiment, that is, the main frame 2, the upper stage portion 4, and the control unit 7 can basically be directly used as the main frame, the upper stage portion, and the control unit in the second embodiment. . Therefore, the following description will focus on the differences from the first embodiment, especially the structure and operation of the loading object stage. In addition, the same code|symbol is attached|subjected to the same structure as 1st Embodiment, and description is abbreviate|omitted.

[0160] Figure 17 It is a figure which shows the main part of 2nd Embodiment of the pattern for...

no. 3 approach

[0192] Next, a third embodiment of the pattern forming apparatus of the present invention will be described. The pattern forming apparatus of the third embodiment is different from the pattern forming apparatus 1 of the above-mentioned first embodiment only in a part of the structure of the loading and unloading stage portion. On the other hand, other structures in the first embodiment, that is, the main frame 2, the upper stage portion 4, and the control unit 7 can basically be directly used as the main frame, the upper stage portion, and the control unit, etc. in the third embodiment. . Therefore, the following description will focus on the differences from the first embodiment, especially the structure and operation of the loading object stage. In addition, the same code|symbol is attached|subjected to the same structure as 1st Embodiment, and description is abbreviate|omitted.

[0193] Figure 21 It is a figure which shows the main part of 3rd Embodiment of the pattern ...

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Abstract

The invention relates to a pattern forming apparatus and a pattern forming method. The pattern forming apparatus comprises: a first holder unit (61) which holds a rubber blanket (BL) carrying a pattern forming material (PT) on one surface in a horizontal posture with a carrying surface for the pattern forming material faced up; a second holder unit (41) which holds a plate (PP) for patterning the pattern forming material or a substrate (SB), to which a pattern is transferred, as a processing object such that the processing object is proximate to and facing the carrying surface of the rubber blanket (BL) held on the first holder unit (61); and a push-up unit (641) which partially pushes up an effective area in a central part of the rubber blanket (BL) from a lower surface side of the rubber blanket (BL) to bring the effective area into contact with the processing object held on the second holder unit (41) and moves along the lower surface of the rubber blanket (BL) to change a push-up position of the rubber blanket (BL).

Description

technical field [0001] The present invention relates to a pattern forming device and a pattern forming method for patterning a pattern forming material carried on a blanket with a plate, or transferring the formed pattern to a substrate to form a pattern. Background technique [0002] There is a technique for forming a pattern on a substrate such as a glass substrate or a semiconductor substrate, in which a blanket carrying a pattern is brought into close contact with the substrate to transfer the pattern to the substrate. In addition, there is a technique of carrying a pattern on a blanket by bringing a plate (negative plate) into pressure contact with a uniform film formed on the surface of the blanket from a pattern forming material, and making the Unnecessary parts are attached to the plate and removed, leaving only the part to be the pattern on the blanket to form a pattern (pattern forming). [0003] As one of such techniques, for example, the printing technique descr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B41F7/02B41M1/06
CPCB29C59/02B29C59/026B41F17/14B41F16/00B41M5/0358
Inventor 川越理史增市干雄上野博之正司和大芝藤弥生上野美佳
Owner DAINIPPON SCREEN MTG CO LTD
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