Array substrate and preparation method thereof and display device
An array substrate, substrate substrate technology, applied in nonlinear optics, instruments, optics, etc., to achieve the effect of simplifying the structure, simplifying the manufacturing process, and reducing power consumption
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Embodiment approach 1
[0087] Embodiment 1: The photoelectric conversion component is located between the film layer where the gate line is located and the base substrate, that is, the photoelectric conversion component is located on the base substrate and below the film layer where the gate line is located.
[0088] Preferably, the photoelectric conversion component is located between the film layer where the gate line is located and the substrate;
[0089] The array substrate further includes: an insulating layer, located between the film layer where the gate line is located and the photoelectric conversion component, and fully covering the photoelectric conversion component.
[0090] For example, if Figure 1a As shown, the array substrate includes: a base substrate 00 , a photoelectric conversion component 10 on the base substrate 00 , an insulating layer 50 on the photoelectric conversion component 10 , and a film layer on which the gate line 20 is located on the insulating layer 50 .
[0091] ...
Embodiment approach 2
[0148] Embodiment 2: The photoelectric conversion component is located between the film layer where the data line is located and the film layer where the gate line is located, that is, the photoelectric conversion component is located above the film layer where the gate line is located, and below the film layer where the data line is located.
[0149] For example, if Figure 1b As shown, the array substrate includes: a base substrate 00, a film layer on which the gate line 20 is located on the base substrate 00, a gate insulating layer 60 located on the film layer where the gate line 20 is located, and a photoelectric conversion component located on the gate insulating layer 60. 10. The insulating layer 50 on the photoelectric conversion component 10 and the film layer where the data line 30 is located on the insulating layer 50 .
[0150] In practice, when the optical signal absorbed by the photoelectric conversion component is the optical signal emitted by the backlight sour...
Embodiment approach 3
[0189] Embodiment 3: The photoelectric conversion component is located on the film layer where the data line is located.
[0190] For example, if Figure 1c As shown, the array substrate includes: a base substrate 00, a film layer on which the gate line 20 is located on the base substrate 00, a gate insulating layer 60 located on the film layer where the gate line 20 is located, and a data line 30 located on the gate insulating layer 60. The film layer where the data line 30 is located, the insulating layer 50 located on the film layer where the data line 30 is located, the photoelectric conversion component 10 located on the insulating layer 50 , and the passivation layer 70 located on the photoelectric conversion component 10 .
[0191] In practice, when the optical signal absorbed by the photoelectric conversion component is the optical signal emitted by the backlight source, the photoelectric conversion component in Embodiment 3 can still absorb the optical signal emitted ...
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