Multi-zone gas injection upper electrode system

Abstract

A system and method of plasma processing includes a plasma processing system including a plasma chamber and a controller coupled to the plasma chamber. The plasma chamber includes a substrate support and an upper electrode opposite the substrate support, the upper electrode having a plurality of concentric gas injection regions.

Description

technical field [0001] The present invention relates generally to plasma processing methods and systems, and more particularly, to methods and systems for having multiple gas injection regions at an upper electrode of a plasma chamber. Background technique [0002] FIG. 1A is a side view of a typical plasma chamber 100 . A typical plasma chamber 100 has a single showerhead-type upper electrode 102, and a substrate support 140 for supporting a substrate 130 while it is being processed by a plasma 150. [0003] FIG. 1B is a more detailed view of a typical top electrode in plasma chamber 100 . Typically, the showerhead-type upper electrode 102 includes a plurality of layers 104 , 110 , 120 , 125 . The surface layer 104 includes a plasma exposed surface 104A and a plurality of exhaust ports 106 . Plasma-exposed surface 104A is the surface of the surface layer that is exposed to plasma 150 . The exhaust ports are distributed substantially evenly throughout the plasma chamber ...

AI Technical Summary

Problems solved by technology

[0006] Unfortunately, for various reasons, the plasma treatment is not always uniform across the center to edge of the substrate 130

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