Developing method and developing device

A developing method and technology of a developing machine, which are applied in the developing field, can solve the problems of uneven line width of lithography patterns, cannot realize local adjustment of line width development, etc., and achieve the effect of improving uniformity

Inactive Publication Date: 2014-09-24
BOE TECH GRP CO LTD +1
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  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

The line width of the photolithographic pattern prepared by this developing method is uneven, and the line width of the photolithographic pattern gradually becomes wider from the side a of the glass substrate 2 to the side b the

Method used

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  • Developing method and developing device

Examples

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Embodiment Construction

[0051] The principles and features of the present invention are described below in conjunction with the accompanying drawings, and the examples given are only used to explain the present invention, and are not intended to limit the scope of the present invention.

[0052] Such as figure 2 As shown, the invention provides a developing method, comprising the steps of:

[0053] Step S1, such as image 3 As shown, the control substrate 100 is inclined to the first direction by a first angle θ relative to the developing machine 200 1 , so that the first side a of the substrate 100 is upward, and the second side b opposite to the first side a is downward, and the plurality of nozzles arranged above the substrate are controlled to be evenly arranged parallel to the substrate On the first plane of the substrate 100, and through the plurality of nozzles, the developer is evenly sprayed onto the substrate 100 from above the substrate 100 for development, and the development time is t...

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Abstract

The invention provides a developing method and a developing device. The method comprises the following steps of controlling a base plate to incline for a first angle theta 1 towards a first direction relative to a developing machine table, controlling a plurality of spray nozzles to be on the first plane parallel to the base plate, uniformly spraying developing liquid on the base plate for developing; controlling the base plate to incline for a second angle theta 2 towards a second direction relative to the developing machine table, controlling the plurality of the spray nozzles to be on a second plane parallel to the base plate, and uniformly spraying the developing liquid on the base plate for developing; controlling the base plate to incline for a third angle theta 3 towards a third direction relative to the developing machine table, controlling the plurality of the spray nozzles to be on the third plane parallel to the base plate, uniformly spraying the developing liquid on the base plate for developing; and controlling the base plate to incline for a fourth angle theta 4 towards a fourth direction relative to the developing machine table, controlling the plurality of the spray nozzles to be on a fourth plane parallel to the base plate, and uniformly spraying the developing liquid on the base plate for developing. According to the scheme, the linear width uniformity of a developed photoetching pattern can be improved.

Description

technical field [0001] The invention relates to the technical field of developing, in particular to a developing method and a developing device. Background technique [0002] In the production process of TFT-LCD (Thin Film Field Effect Transistor Liquid Crystal Display), the photoresist coated on the glass substrate needs to be developed after exposure to obtain the required photolithography pattern. [0003] Such as figure 1 As shown, in the prior art, a development method applied to a high-generation production line, the glass substrate 2 moves along the horizontal developing machine 1 at an inclination angle θ, and the inclination angle θ between the glass substrate 2 and the developing machine 1 is always Keeping the same, the plurality of nozzles 3 are evenly fixed on the flat nozzle frame 4 , the nozzle frame 4 is arranged above the glass substrate 2 , and the nozzle frame 4 is parallel to the glass substrate 2 . During the development process, the developer is spray...

Claims

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Application Information

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IPC IPC(8): G03F7/30
Inventor 冯贺吴洪江王耸杨同华董明
Owner BOE TECH GRP CO LTD
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