Developing method and developing device
A developing method and technology of a developing machine, which are applied in the developing field, can solve the problems of uneven line width of lithography patterns, cannot realize local adjustment of line width development, etc., and achieve the effect of improving uniformity
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0051] The principles and features of the present invention are described below in conjunction with the accompanying drawings, and the examples given are only used to explain the present invention, and are not intended to limit the scope of the present invention.
[0052] Such as figure 2 As shown, the invention provides a developing method, comprising the steps of:
[0053] Step S1, such as image 3 As shown, the control substrate 100 is inclined to the first direction by a first angle θ relative to the developing machine 200 1 , so that the first side a of the substrate 100 is upward, and the second side b opposite to the first side a is downward, and the plurality of nozzles arranged above the substrate are controlled to be evenly arranged parallel to the substrate On the first plane of the substrate 100, and through the plurality of nozzles, the developer is evenly sprayed onto the substrate 100 from above the substrate 100 for development, and the development time is t...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com