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295results about How to "Meet process requirements" patented technology

Intelligent spraying device for use in streamline production operation

The invention discloses an intelligent spraying device for use in streamline production operation, which comprises a machine frame and a control device, wherein the machine frame comprises a base and an upright post. The intelligent spraying device is characterized in that: the upright post is provided with at least one layer of working platform; at least one set of spray gun component is arranged on the working platform; the spray gun component is provided with a plane swinging mechanism and a pitching mechanism; the working platform has a lifting mechanism; the control device is electrically connected with the plane swinging mechanism and the pitching mechanism respectively to enable the spray gun component to perform plane scanning and up and down scanning according to programs set in the control device; and the control device is electrically connected with the lifting mechanism to allow the working platform to move up and down according to a program set in the control device. The intelligent spraying device has the advantages that: the posture of the spray gun can be combined at any time so as to meet different spray process requirements; a point-to-point spraying or fuzzy spraying mode can be realized; the high-speed and uniform spraying of workpieces on a steam production line can be realized without reversing the workpieces in a spraying process; and the equipment investment can be reduced greatly.
Owner:宁波能特环保科技有限公司

Preparation method for highly-doped phosphorosilicate glass film

The invention discloses a preparation method for a highly-doped phosphorosilicate glass film. The preparation method includes the following steps: forming a gate oxide layer, a polycrystalline silicon gate and a side wall on a silicon substrate; injecting a drain source and carrying out rapid thermal annealing; depositing an SACAD PSG (Selected Area Chemical Vapor Deposition Phosphosilicate Glass) film; depositing an HDP PSG (High Density Polyethylene Phosphosilicate Glass) film; and etching a contact hole. According to the preparation method, the phenomenon that the silicon substrate is damaged by over etching of the contact hole can be avoided; and the PSG film prepared by the method has excellent hole-filling performance and a film structure easy to etch. During preparation, firstly, a layer of PSG film is grown by using an SACAD deposition process; and secondly, a highly-doped PSG film is grown by using an HDP CAD deposition process. Due to the utilization of the characteristic that the SACAD PSG film is uniform in the phosphor doping mount, the position of a starting point at the bottom of the HDP PSG film flower-shaped casing is heightened, a process window for selective etching of the contact hole is increased and further the phenomenon that the silicon substrate is damaged caused by the over etching of the contact hole and the performances of the devices are effectively maintained.
Owner:SHANGHAI HUAHONG GRACE SEMICON MFG CORP

Steel tube online cooling process control system and method

The invention relates to online heat treatment technologies for steel tube production, in particular to a steel tube online cooling process control system and method. The steel tube online cooling process control method comprises the steps that the steel tube online cooling process control system receives steel tube original data and cooling target technological data which are sent by an upper computer system; and according to steel tube actually-measured data in the previous working procedure and through operation of a model comprising a presetting calculation module, a feedforward control module and a feedback control calculation module, a steel tube operation speed curve of an online cooling area, spraying ring configuration and the cooling water pressure and flow are set for a steel tube online cooling basic automation system, automatic control over the steel tube online cooling process is achieved, and accordingly precise temperature control over the final cooling temperature of the steel tube product is achieved. The steel tube online cooling process control system and method is used for automatic control over the cooling process of a steel tube online cooling production device, and the steel tube online cooling production device is arranged beside a main conveying roller way line behind a sizing mill parallelly.
Owner:BAOSHAN IRON & STEEL CO LTD +1

Energy-saving die casting machine

ActiveCN103752792AMeet the needs of maximum oil volumeExtended service lifeControl systemDie casting
An energy-saving die casting machine which comprises a die locking oil cylinder, an injection oil path body, a first oil path system, a second oil path system, a third oil path system, a slow injection system, an injection energy accumulator, a boost energy accumulator and a low-pressure energy accumulator. The first oil path system, the second oil path system and the third oil path system are connected with the injection energy accumulator, the boost energy accumulator and the low-pressure energy accumulator respectively. A die locking body is connected with the first oil path system, the second oil path system and the third oil path system through an oil path control system. The injection oil path body comprises a main oil cylinder; the injection energy accumulator and the boost energy accumulator are arranged on the main oil cylinder, the injection energy accumulator acts on the rear portion in the direction of oil path injection, and the boost energy accumulator acts on the front portion of the direction of oil path injection; an output end of the slow injection system is connected with the oil path control system; in the die assembling process, the low-pressure energy accumulator drives a die locking push rod in the die locking oil cylinder to act, and after die assembly is completed, the slow injection system charges the low-pressure energy accumulator.
Owner:东莞市益格机电有限公司

Continuous production-type ultrasonic atomization spraying film-coating equipment

The invention discloses continuous production-type ultrasonic atomization spraying film-coating equipment. A heating device is arranged at the middle part of a continuous conveying device, a film-coating device is arranged above the continuous conveying device and faces the heating device, a spraying cavity is arranged in a housing in the film-coating device, a spraying cooling cavity is arranged in the outer wall of the spraying cavity, and the spraying cooling cavity extends to an outlet part from the middle part of the spraying cavity, and communicates with external spraying cooling liquid inlet tube and spraying cooling liquid outlet tube simultaneously; and an ultrasonic atomization assembly, an air blowing nozzle and a gas inlet tube are arranged at an inlet of the spraying cavity, the gas inlet tube blows a carrier gas in the spraying cavity through the air blowing nozzle, the carrier gas carries mist generated by the ultrasonic atomization assembly, and the mist is conveyed to an outlet of the spraying cavity to carry out a high-temperature pyrolysis reaction on the upper surface of a workpiece to be subjected to film-coating, thus film-coating on the upper surface of the workpiece is realized. The continuous production-type ultrasonic atomization spraying film-coating equipment disclosed by the invention is capable of continuously carrying out film-coating on the surface of the workpiece, thus the film-coating efficiency is greatly increased, and the process need of continuous film-coating of some workpieces can be met.
Owner:CHONGQING UNIV OF TECH

Technical configuration method for major-diameter aluminum-alloy round cast ingot heating facility

InactiveCN101817030ASolve the large radial temperature differenceMeet process requirementsExtrusion control devicesNatural gasHeating furnace
The invention relates to a technical configuration method for a major-diameter aluminum-alloy round cast ingot heating facility, which comprises preheating and gradient heating; in the preheating step, aluminum-alloy round cast ingots are conveyed to a natural gas preheating furnace by a chain and chain conveying motor and heated at 300-350 DEG C; and in the gradient heating step, the aluminum-alloy round cast ingots moving out of the natural-gas preheating furnace are adjusted through a rotating plate by 90 degrees, pushed to an ingot conveying dolly and conveyed to an induction heating furnace for gradient heating. The heating coils are divided into different sections; the heating coils in different sections are different in temperature control, and an end temperature compensation coil is additionally arranged outside the heating coil at the discharge end of the induction heating furnace; the temperature of the end temperature compensation coil is 420-500 DEG C; the temperature gradients of in different sections from the heating coils to the temperature compensation coil are controlled to be 60-100 DEG C/m; and the aluminum-alloy round cast ingots processed by gradient heating are conveyed in front of an extruder through an extruder ingot conveying dolly to carry out simulated isothermal extrusion. The invention solves the problem of great radial temperature difference which frequently occurs in major-diameter cast ingot heating.
Owner:CHINA NON-FERROUS METALS PROCESSING TECH CO LTD

System for realizing detritiation of water and realizing method of system

The invention discloses a system for realizing detritiation of water. The system comprises a catalytic exchange system, a hydrogen supply system, a tritium-containing water supply system, a tritium-containing hydrogen drying and collecting system, a low-tritium-content water collecting system, a condensing system and a detecting control device. The system can meet all the process requirements of detritiation of water, including continuous treatment processes of vacuumizing the system before operation and alternately drying and activating a molecular sieve bed; the system is reasonable in layout, and the tritium-containing water purification efficiency is greatly improved; and meanwhile, tritium-containing hydrogen with high concentration can be obtained. Meanwhile, the system is convenient to operate and low in energy consumption; the interphase contact area of gas and liquid in the catalytic exchange system is large, the mass transfer coefficient is large, and the reaction efficiency is high; and furthermore, fluid can flow in a fixed direction, so as to quantitatively control the water detritiation efficiency. The catalytic exchange device is simple in structure; compared with a conventional water detritiation exchange column, the catalytic exchange device has the advantage that the height is obviously reduced, and investment of equipment and investment of catalysts are greatly reduced.
Owner:MATERIAL INST OF CHINA ACADEMY OF ENG PHYSICS

Wafer-level back gold chip packaging structure and packaging method thereof

The present invention discloses a back gold chip packaging structure and a packaging method thereof, belonging to the technical field of semiconductor packaging. A plurality of chip electrodes and front protective layers are arranged at the front surface of a silicon-based body, each front protective layer is provided with one front protective layer opening to expose chip electrodes again, and metal bump are arranged at the surfaces of the chip electrodes. The back surface of the silicon-based body is provided with a back gold layer, the back gold layer is in bonding connection with the back surface of the silicon-based body through a back gold bonding layer. A plastic packaging layer packages exposed surfaces of the back gold layer and the silicon-based body, and a plastic packaging layeropening is arranged to expose the exposed surface of the back surface of the back gold layer. The wafer-level back gold chip packaging structure and the packaging method thereof are simple in packaging flow, the silicon face processing technology, the back gold technology, the plastic packaging material ablation and the de-bonding technology are completed on a wafer, and therefore, the wafer-level back gold chip packaging structure and the packaging method thereof accord with future development direction of semiconductor manufacturing.
Owner:JIANGYIN CHANGDIAN ADVANCED PACKAGING CO LTD

Developing method and developing device

InactiveCN104062857AImprove uniformityRealize all-round oblique developmentPhotosensitive material processingSpray nozzleEngineering
The invention provides a developing method and a developing device. The method comprises the following steps of controlling a base plate to incline for a first angle theta 1 towards a first direction relative to a developing machine table, controlling a plurality of spray nozzles to be on the first plane parallel to the base plate, uniformly spraying developing liquid on the base plate for developing; controlling the base plate to incline for a second angle theta 2 towards a second direction relative to the developing machine table, controlling the plurality of the spray nozzles to be on a second plane parallel to the base plate, and uniformly spraying the developing liquid on the base plate for developing; controlling the base plate to incline for a third angle theta 3 towards a third direction relative to the developing machine table, controlling the plurality of the spray nozzles to be on the third plane parallel to the base plate, uniformly spraying the developing liquid on the base plate for developing; and controlling the base plate to incline for a fourth angle theta 4 towards a fourth direction relative to the developing machine table, controlling the plurality of the spray nozzles to be on a fourth plane parallel to the base plate, and uniformly spraying the developing liquid on the base plate for developing. According to the scheme, the linear width uniformity of a developed photoetching pattern can be improved.
Owner:BOE TECH GRP CO LTD +1

Louver vibration screening device

The invention discloses a louver vibration screening device, and relates to a screening system in a tobacco threshing redrying factory. The louver vibration screening device comprises a vibration groove body. Fixed sliding rails are arranged on the front side and the rear side of the vibration groove body, space adjusting sliding rails are arranged above the fixed sliding rails on the two sides of the vibration groove body respectively, and sliding grooves are formed in the opposite sides of the vibration groove body and the space adjusting sliding rails. W-shaped supporting structures are arranged between the fixed sliding rails on the two sides and the space adjusting sliding rails, and the W-shaped supporting structures are connected with louver blades. Angle adjusting sliding rails are arranged on the vibration groove body and located above the space adjusting sliding rails on the two sides respectively, sliding grooves are formed in the opposite sides of the angle adjusting sliding rails, the two ends of each louver blade are connected with angle adjusting shafts, and the other ends of the angle adjusting shafts are arranged in the sliding grooves of the angle adjusting sliding rails in a sliding mode respectively. According to the louver vibration screening device, the angles and the spaces of louvers can be adjusted according to the technological requirement, so that the optimum screening effect is achieved, threshed oversized leaves are screened out to be subjected to secondary treatment, and therefore the technological requirement can be met.
Owner:JIANGSU HENGSEN TOBACCO MACHINERY +5

Method for low-temperature pyrolysis and resource utilization of household garbage incineration fly ash

The invention discloses a household garbage incineration fly ash low-temperature pyrolysis and resource utilization method, which comprises the steps: unloading fly ash from a storage tank, feeding into a pyrolysis furnace, and carrying out low-temperature pyrolysis; discharging from the pyrolysis furnace, detecting the total residual amount of dioxins in the fly ash pyrolyzing product, feeding the fly ash pyrolyzing product with the total residual amount exceeding 50 ng-TEQ/kg back to the pyrolyzing furnace, continuously pyrolyzing, and preparing the qualified fly ash pyrolyzing product withthe total residual amount not exceeding 50ng-TEQ/kg into a mine filler, wherein the mine filler is prepared by stirring a cementing agent, aggregate, water and an additive, and the cementing agent isprepared by homogenizing a qualified fly ash pyrolysis product, slag, slag and industrial byproduct gypsum; and sequentially feeding the flue gas generated in the pyrolysis furnace into a secondary combustion chamber, a waste heat recovery system, a deacidification system and a dust removal system, and discharging until atmospheric pollutants in the flue gas meet the national emission standard. According to the method, resource utilization of the fly ash is achieved, the absorption capacity is high, the cost is low, and environmental safety is guaranteed.
Owner:北科蕴宏环保科技(北京)有限公司

Fuel assembly grab using wedge to realize self-locking

The invention relates to a fuel assembly grab using a wedge to realize self-locking. The grab comprises a grab flange, a grabbing hook bearer, a grabbing hook, a pin shaft, a driving sleeve, a grab guiding column, a sliding sleeve, a wedge, screws and springs. The grabbing hook is installed on the grabbing hook bearer through the pin shaft, the grabbing hook is connected with the driving sleeve, the upper portion of the driving sleeve is connected with the driving mechanism of the grab, and the driving mechanism drives the driving sleeve to lift in order to realize the release and engagement of the grabbing hook; and a compression gap is residual between the top of the grab guiding column and the gap flange, the grab guiding column is connected with the sliding sleeve, the side surface of the sliding sleeve is provided with the wedge, the sliding sleeve is guided by the screws arranged on the bottom surface of the grab flange, the springs cover the screws, and he springs are connected with the sliding sleeve and the grab flange respectively. The grab realizes self-locking depended on the compacting force of the springs and the cooperative contact of the wedge with the grabbing hook, has the advantages of simple and compact structure and safe and reliable operation, and can effectively meet the technological demands of fuel operation of nuclear power plants.
Owner:CHINA NUCLEAR POWER ENG CO LTD

Waste heat recovering system capable of continuously generating steam aiming at impure waste water resources

The invention discloses a waste heat recovering system capable of continuously generating steam aiming at impure waste water resources. The system comprises a second-type absorption heat pump, a front water tank, a filtering device, a water pump and a plate type heat exchanging device, wherein cooling water is input into a condenser of the second-type absorption heat pump and is output after heat exchanging, the output end of an evaporator is connected with the input end of a generator, the output end of the generator is connected with the plate type heat exchanging device, tap water is input into the evaporator and forms circulating water through the evaporator, the generator, the water pump and the plate type heat exchanging device, discontinuous waste hot water is changed into continuous waste hot water through the front water tank, input into the plate type heat exchanging device after impurities are filtered out through the filtering device, and then discharged as low-temperature waste hot water through heat exchanging. Low-temperature clear water is input into an absorber after passing through the water pump, and then is output as steam needed by a user. The system has the advantages that the utilization rate of the waste hot water is high, and the steam generating efficiency is high.
Owner:HANGZHOU WORUN ENERGY SAVING TECH

Semiconductor structure and forming method thereof

The invention provides a semiconductor structure and a forming method thereof. The forming method comprises the steps that a substrate is provided; a number of discrete core layers are formed on the substrate; sacrificial side walls are formed on the side walls of the core layers; each sacrificial side wall on one side of a core layer is a first sacrificial side wall, and each sacrificial side wall on the other side of the core layer is a second sacrificial side wall; the first sacrificial side walls and the second sacrificial side walls are spaced apart; a first mask side wall is formed on the side wall of each first sacrificial side wall; the core layers are removed, and openings are formed in the sacrificial side walls; a second mask side wall is formed on the side wall, which is exposed by an opening, of each second sacrificial side wall; the sacrificial side walls are removed; and the first mask side walls and the second mask side walls are used as masks to etch the substrate to form a target pattern. According to the invention, the process difficulty of a photolithography process is reduced; the process operability is improved; the shape and size of a target pattern can meetthe process requirements; and the device performance and the performance uniformity are improved.
Owner:SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORP +1
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