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Reticle Defect Inspection Using Systematic Defect Filter

A defect, mask technology, applied in the field of mask inspection, can solve the problem of not being able to capture small

Active Publication Date: 2019-05-07
KLA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Depending on whether this threshold is set too high or too low, this technique may fail to catch small defects and may also catch a large number of "false" defects

Method used

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  • Reticle Defect Inspection Using Systematic Defect Filter
  • Reticle Defect Inspection Using Systematic Defect Filter
  • Reticle Defect Inspection Using Systematic Defect Filter

Examples

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example

[0072] Figure 6A is a simplified schematic representation of a typical photolithography system 600 that may be used to transfer a mask pattern from a photomask M onto a wafer W, according to certain embodiments. Examples of such systems include scanners and steppers, more particularly the PAS 5500 system available from ASML, Veldhofen, The Netherlands. In general, an illumination source 603 directs a beam of light onto a photomask M located in a mask plane 602 via an illumination lens 605 . The illumination lens 605 has a numerical aperture 601 at a plane 602 . The value of numerical aperture 601 affects which defects on the photomask are lithographically significant and which are not. A portion of the light beam passing through photomask M forms a patterned optical signal that is directed through imaging optics 653 and onto wafer W to initiate pattern transfer.

[0073] Figure 6B A schematic representation of an inspection system 650 having an imaging lens 651a having a...

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PUM

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Abstract

Methods and apparatus for inspecting photolithography reticles are disclosed. A defect data stream is received from a reticle inspection system, wherein the defect data identifies a plurality of defects detected for a plurality of different portions of the reticle. prior to reviewing the defect data to determine whether the reticle passes inspection and while continuing to receive the defect data stream, automatically grouping some of the defects with other one or more most recently received defects so that Groups are formed that substantially match the defects. Automatically filtering from the defect data those of the group of defects having a higher than predetermined value before reviewing the defect data to determine whether the reticle passes inspection and after receiving all of the defect data for the reticle A threshold number of one or more defect groups to form filtered defect data. The filtered defect data can then be provided to an inspection station to determine whether the reticle is acceptable or not.

Description

[0001] Related Application Cross Reference [0002] This application asserts the benefit of the following prior applications: (i) Li Bing et al., entitled "Reticle Defect Inspection with Systematic Defect Filter," dated March 8, 2012 U.S. Provisional Application No. 61 / 608,445 filed and (ii) Li Bing et al., April 9, 2012, entitled "Reticle Defect Inspection with Systematic Defect Filter" US Provisional Application No. 61 / 621,725, which was filed, is hereby incorporated by reference in its entirety for all purposes. technical field [0003] The present invention relates generally to the field of photomask inspection. More particularly, the present invention relates to a method to filter systematic defects from reticle defect detection. Background technique [0004] In general, the semiconductor manufacturing industry involves highly complex techniques for fabricating integrated circuits using semiconductor materials laid out in layers and patterned onto a substrate, such a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/84
CPCG01N21/95607G03F1/84G06T7/001G01N2021/95676G06T2207/30148G06T7/0002
Inventor 李冰伟敏·马约瑟夫·布莱谢
Owner KLA CORP