Light-emitting diode chip and manufacturing method thereof
A technology of light-emitting diodes and manufacturing methods, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., and can solve the problems of falling off of P-type pads and N-type pads of light-emitting diode chips, and achieve the effects of improving service life and preventing falling off
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Embodiment 1
[0037] The embodiment of the present invention provides a light-emitting diode chip, which can be fabricated by the method provided in Embodiment 2, see figure 1 The LED chip includes a substrate 1 , an N-type layer 2 , a multi-quantum well layer 3 , a P-type layer 4 , a transparent conductive layer 5 , a P-type pad 6 , an N-type pad 7 , and a passivation layer 8 .
[0038] In this embodiment, the N-type layer 2, the multi-quantum well layer 3, and the P-type layer 4 are sequentially stacked on the substrate 1, and the light-emitting diode chip is provided with a groove extending from the P-type layer 4 to the N-type layer 2, A transparent conductive layer is stacked on the P-type layer 4 . The P-type layer 4 and the transparent conductive layer 5 are provided with a first annular groove extending from the transparent conductive layer 5 to the P-type layer 4, and a P-type pad 6 is arranged in the first annular groove, and the N-type pad 6 in the groove Layer 2 is provided wit...
Embodiment 2
[0059] The embodiment of the present invention provides a method for manufacturing a light-emitting diode chip, which can be used to make the light-emitting diode chip provided in Embodiment 1, see figure 2 , the production method includes:
[0060] Step 201: growing an N-type layer, a multi-quantum well layer, and a P-type layer sequentially on the substrate.
[0061] Figure 3a It is a schematic structural diagram of the LED chip obtained after step 201 is performed. Wherein, 1 represents a substrate, 2 represents an N-type layer, 3 represents a multi-quantum well layer, and 4 represents a P-type layer.
[0062] Specifically, this step 201 may include:
[0063] Using MOCVD (Metal Organic Chemical Vapor Deposition, Metal Organic Compound Chemical Vapor Deposition) equipment to sequentially grow N-type layer, multiple quantum well layer, and P-type layer on the substrate.
[0064] Specifically, the material and thickness of each layer of the light emitting diode chip may ...
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