Device and method for producing continuous low-temperature large-section atmospheric pressure plasma plumes
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- HEBEI UNIVERSITY
- Publication Date
- 2015-03-11
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to the technical field of low-temperature plasma, in particular to a device and method for generating a continuous low-temperature large-section atmospheric-pressure plasma plume. Background technique
[0002] The low-temperature plasma (or plasma plume) produced by atmospheric pressure uniform discharge has a wide range of application values in industry, biomedicine, and military affairs, such as material preparation, surface treatment, material etching, ozone synthesis, water treatment, and industrial waste gas desulfurization Denitrification, sterilization, aircraft drag reduction, aircraft stealth and other fields. At present, dielectric barrier discharge is the most commonly used technology to generate atmospheric pressure uniform discharge plasma, but due to the limitation of the size of the discharge gap between two electrodes, the application of dielectric barrier discharge to generate uniform plasma is greatly limited. ...