Flexible, stretchable and deformable curved surface optical lithography template as well as optical lithography method and device

A flexible template, flexible technology, applied in the field of nano-processing, to achieve the effect of reducing production costs

Active Publication Date: 2015-05-13
TIANJIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Mask sheets and flexible LED panels can be used multiple times

Method used

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  • Flexible, stretchable and deformable curved surface optical lithography template as well as optical lithography method and device
  • Flexible, stretchable and deformable curved surface optical lithography template as well as optical lithography method and device
  • Flexible, stretchable and deformable curved surface optical lithography template as well as optical lithography method and device

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Embodiment Construction

[0030] The technical scheme of the present invention is: making a stretchable flexible photolithography mask; making a flexible ultraviolet light-emitting diode (LED) panel as a light source for exposure; tightly attaching the flexible and stretchable template to the On the substrate coated with photoresist (it can be flat or complex curved surface); attach the flexible LED panel tightly to the flexible template; according to the appropriate dose and corresponding exposure time, turn on the LED to expose the photoresist; remove the flexible LED panel; remove the mask; this exposure is complete. Development and subsequent processing can then be performed. Mask sheets and flexible LED panels can be used multiple times.

[0031] The steps in the technical solution are described in detail below

[0032] (1) Fabricate a stretchable flexible photolithography mask

[0033] The stretchable flexible mask can be made of low Young's modulus silicone, such as PDMS (Polydimethylsiloxan)...

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Abstract

The invention relates to the field of nano processing. In order to realize that (1) a system can realize optical lithography on a substrate of a complicated curved surface, and (2) the system can realize optical lithography of similar figures, which are different from one another in period or interval, by using one template, the invention provides a flexible, stretchable and deformable curved surface optical lithography template and an optical lithography method. The method comprises the following steps: manufacturing a stretchable flexible optical lithography mask plate; manufacturing a flexible ultraviolet light-emitting diode LED panel used as a light source for exposure; tightly adhering the stretchable flexible optical lithography mask plate to a substrate coated with photoresist under the effect of controllable stress; tightly adhering the flexible LED panel to the flexible template; turning on the LED for exposure of the photoresist according to a proper amount of dosage and corresponding exposure time; taking down the flexible LED panel; taking down the mask plate; completing the exposure; performing developing and subsequent machining processes. The flexible, stretchable and deformable curved optical lithography template and the optical lithography method are mainly used for design and manufacture of switch capacitance integrators.

Description

technical field [0001] The invention relates to the field of nano-processing, in particular to a flexible, stretchable and deformable curved surface photolithography template and a photolithography method and device. technical background [0002] Optical lithography is a commonly used technique in the field of micro-and-nano-fabrication. Almost all electronic chips are fabricated using micro- and nano-fabrication processes including photolithography. Photolithography is to irradiate the substrate with photoresist with ultraviolet lamp through the photolithography template. The photoresist changes its shape in the light-transmitting part according to the pattern on the template. After development, the pattern on the template is transferred to the on photoresist. At present, the photolithography technology used for integrated circuit processing can achieve a spatial resolution of 14nm; it can be said that it is the photoresist technology that promotes the development of inte...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 胡小龙程宇豪顾超朱晓田
Owner TIANJIN UNIV
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