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Photocurable composition and method of manufacturing film using the composition

A technology of photocurability and manufacturing method, which is applied in semiconductor/solid-state device manufacturing, removal of conductive materials by chemical/electrolytic methods, and photoplate-making process of patterned surfaces, etc. It can solve the problems of low productivity and long-time irradiation question

Active Publication Date: 2015-05-20
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Light irradiation for gas generation takes a long time, so productivity is low

Method used

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  • Photocurable composition and method of manufacturing film using the composition
  • Photocurable composition and method of manufacturing film using the composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0165] (1) Photocurable composition

[0166] First, the following component (A), component (B), component (C) and component (D) were compounded to provide a mixed solution.

[0167] (1-1) Component (A): trimethylolpropane triacrylate (manufactured by Sigma-Aldrich Co. LLC.): 100 parts by weight;

[0168] (1-2) Component (B): 2-hydroxy-2-methyl-1-phenyl-propan-1-one (Darocur 1173, manufactured by Ciba Japan): 3 parts by weight;

[0169] (1-3) Component (C): 2,2'-azobis-(N-butyl-2-methylpropionamide) (VAm-110, manufactured by WAKO Pure Chemical Industries, Ltd.): 15 wt. copies; and

[0170] (1-4) Component (D): Hexaethylene glycol mono(1H,1H-perfluoroheptyl) ether shown below: 2 parts by weight

[0171] F(CF 2 ) 6 CH 2 (OCH 2 CH 2 ) 6 Oh)

[0172] Next, the resulting mixed solution was filtered using a filter made of ultra-high molecular weight polyethylene with a mesh opening of 0.2 μm. Thus, the photocurable composition (a-1) of the present example (Example 1) was p...

Embodiment 2

[0190] (1) Photocurable composition

[0191] First, the following component (A), component (B), component (C) and component (D) were compounded to provide a mixed solution.

[0192] (1-1) Component (A): 94 parts by weight in total

[0193] Isobornyl acrylate (manufactured by KYOEISHA CHEMICAL Co., LTD., trade name: IB-XA): 61.6 parts by weight

[0194] (2-Methyl-2-ethyl-1,3-dioxol-4-yl)methacrylate (manufactured by OSAKA ORGANIC CHEMICAL INDUSTRY LTD., trade name: MEDOL-10): 10 parts by weight

[0195] Hexylene glycol diacrylate (manufactured by OSAKA ORGANIC CHEMICAL INDUSTRY LTD., trade name: Viscoat #230): 22.4 parts by weight

[0196] (1-2) Component (B): 3 parts by weight

[0197] Darocur 1173 (manufactured by BASF)

[0198] (1-3) Component (C): 15 parts by weight

[0199] 2,2'-Azobis(N-butyl-2-methylpropionamide) (VAm-110, manufactured by Wako Pure Chemical Industries, Ltd.): 15 parts by weight

[0200] (1-4) Component (D): 1.1 parts by weight

...

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Abstract

A photocurable composition of the present invention to be used for manufacturing a film with high productivity is a photocurable composition to be used for manufacturing a film having a predetermined pattern shape by curing the photocurable composition with light under a state where the photocurable composition is brought into contact with a mold having concavo-convex on a surface thereof, the photocurable composition including: a polymerizable compound; a photopolymerization initiator; a photosensitive gas generating agent for generating a gas through light stimulation; and a gas generation promotor for increasing an aggregation rate of the gas generated from the photosensitive gas generating agent at an interface between the mold and the photocurable composition, in which the gas generation promotor includes a fluorine atom-containing surfactant that is free of a polymerizable substituent.

Description

technical field [0001] The present invention relates to a photocurable composition and a method for producing a film using the composition. Background technique [0002] The UV nanoimprint method is a method of producing a resist film having a predetermined pattern shape on a substrate such as a substrate to be processed, and has, for example, the following production method including steps (a) to (d): [0003] (a) configuring a resist (photocurable composition); [0004] (b) bringing the photocurable composition and a mold having a fine concave-convex pattern formed on its surface into contact with each other; [0005] (c) irradiating the photocurable composition with light; and [0006] (d) The photocurable composition and the mold are separated from each other after irradiation. [0007] It should be noted that the pattern shape of the resist film to be produced by the manufacturing method including steps (a) to (d) is formed by transferring the concavo-convexity of th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F2/48H01L21/027C09D7/47
CPCC08F2/48G03F7/0002C09D4/00C09D7/47B29K2105/0005B29K2909/00B29L2011/00B29L2031/3425C08F222/102C08F222/103G03F7/004G03F7/027G03F7/38G03F7/40G03F7/20G03F7/0048B82Y30/00B82Y40/00C08F22/1006H05K3/06
Inventor 伊藤俊树饭田贤一松藤奈央子
Owner CANON KK
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