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Thyristor electrostatic protection device and its forming method

A technology of electrostatic protection and thyristor, which is applied in the direction of electric solid devices, electrical components, semiconductor devices, etc., can solve problems such as performance to be improved, and achieve uniform current distribution, increase maintenance voltage, and reduce current magnification.

Active Publication Date: 2017-11-03
SEMICON MFG INT (SHANGHAI) CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] However, the performance of the existing thyristor electrostatic protection devices still needs to be improved

Method used

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  • Thyristor electrostatic protection device and its forming method
  • Thyristor electrostatic protection device and its forming method
  • Thyristor electrostatic protection device and its forming method

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Embodiment Construction

[0041] The trigger voltage of the thyristor electrostatic protection device in the prior art is too high, and the maintenance voltage is too low, which is easy to introduce latch-up effect, which is not conducive to the improvement of the performance of the thyristor electrostatic protection device.

[0042] The invention provides a thyristor electrostatic protection device, which reduces the trigger voltage and increases the maintenance voltage.

[0043] In order to make the above objects, features and advantages of the present invention more comprehensible, specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. When describing the embodiments of the present invention in detail, for convenience of explanation, the schematic diagrams will not be partially enlarged according to the general scale, and the schematic diagrams are only examples, which shall not limit the protection scope of the present invention...

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Abstract

A thyristor electrostatic protection device and its forming method, the thyristor electrostatic protection device, comprising: a semiconductor substrate, the semiconductor substrate has a P-type well region and an N-type well region adjacent to the P-type well region Well region; the first P-type doped region located in the P-type well region; the first N-type doped region in the P-type well region between the first P-type doped region and the N-type well region; located in the N-type The second N-type doped region in the well region; the second P-type doped region in the N-type well region between the second N-type doped region and the P-type well region; the first N-type doped region and the P-type well region Between the second P-type doped region and across the first doped region and the second doped region of the P-type well region and the N-type well region, the doped impurities of the first doped region and the second doped region The types of ions are the same, and the concentration of impurity ions in the first doped region is greater than that in the second doped region. The trigger voltage of the electrostatic protection device of the present invention is reduced, and the maintenance voltage is increased.

Description

technical field [0001] The invention relates to the design field of integrated circuit electrostatic protection circuits, in particular to a thyristor electrostatic protection device and a forming method thereof. Background technique [0002] In the production and application of integrated circuit chips, with the continuous improvement of VLSI process technology, the current CMOS integrated circuit production technology has entered the deep submicron stage, the size of MOS devices is continuously shrinking, and the thickness of the gate oxide layer is increasing. The thinner the MOS device is, the lower the withstand voltage capability of the MOS device is, and the harm of electrostatic discharge (ESD) to integrated circuits becomes more and more significant. Therefore, it becomes particularly important to protect integrated circuits from ESD. [0003] In order to strengthen the ability to protect against static electricity, most of the chip's input and output interface (I / ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/02H01L29/06
CPCH01L29/66121H01L29/87H01L27/0262H01L29/0626H01L29/0649H01L29/7436
Inventor 代萌
Owner SEMICON MFG INT (SHANGHAI) CORP
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