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Mask plate and photoetching method

A reticle and photolithography technology, which is applied in microlithography exposure equipment, photolithography exposure devices, optics, etc., can solve the problems of loss of effective area of ​​reticle, messy layout, etc., and achieve low cost, reduced difficulty, and reduced cost Effect

Inactive Publication Date: 2015-08-26
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

A set of barcodes can only contain information consisting of 11 letters or numbers, and can only contain some simple information such as the name of the mask, and the graphics on the mask are generally not a set of exposure graphics. In order to reduce costs, the mask will try to Add more graphics, so that the information of the center coordinates of each graphic can only be recorded separately or marked graphically next to each exposure graphic, which not only loses the effective area of ​​the mask, but also makes the layout messy

Method used

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Embodiment Construction

[0020] The features and technical effects of the technical solution of the present invention will be described in detail below with reference to the accompanying drawings and in combination with schematic embodiments, disclosing a low-cost, fast and simple auxiliary pattern reticle and its manufacturing technology. It should be pointed out that similar reference numerals represent similar structures, and the terms "first", "second", "upper", "lower" and the like used in this application can be used to modify various device structures or manufacturing processes . These modifications do not imply spatial, sequential or hierarchical relationships of the modified device structures or fabrication processes unless specifically stated.

[0021] Such as figure 1 As shown, a reticle according to the present invention includes mask patterns, alignment marks, and additionally includes auxiliary patterns in the form of, for example, two-dimensional codes. There are multiple alignment ma...

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Abstract

The invention provides a mask plate. A mask pattern, an alignment marker and an auxiliary pattern are arranged on a mask plate substrate, wherein the auxiliary pattern is a two-dimensional code. According to the mask plate and a photoetching method, provided by the invention, the rapid, simple and convenient and low-cost auxiliary pattern is formed at the edge part of the mask plate so that the problems that the pattern information of the mask plate is not completely recorded and the mask pattern is disordered are solved; and the difficulty of process development can be reduced through setting the auxiliary pattern and the cost of the process development is reduced.

Description

technical field [0001] The invention relates to the technical field of photolithographic reticle processing technology for integrated circuits, in particular to a new reticle with two-dimensional auxiliary graphics and a photolithography method using the reticle. Background technique [0002] With the development of integrated circuit technology, IC chips are used more and more widely. The complexity of the lithography reticle is getting higher and higher, and the cost is also increasing exponentially. Therefore, more and more patterns will be collected on the reticle suitable for the stepper (step) lithography machine. Generally, the photolithography mask consists of well-distributed exposure patterns, alignment marks, and auxiliary patterns. The existing auxiliary graphics are generally plate-making information composed of barcodes, graphics for auxiliary development, and so on. A set of barcodes can only contain information consisting of 11 letters or numbers, and can o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/42G03F7/20
CPCG03F1/42G03F7/70633
Inventor 王冠亚
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI