Unlock instant, AI-driven research and patent intelligence for your innovation.

A kind of easily degradable environment-friendly silicon wafer cleaning agent and preparation method thereof

A silicon wafer cleaning agent, an environmentally friendly technology, applied in the directions of detergent compounding agents, detergent compositions, chemical instruments and methods, etc., can solve the problems of incompatibility of cleaning ability and biodegradability, difficulty in rinsing, and large production, etc. Achieving the effect of easy biodegradation, strong cleaning ability and less foam

Active Publication Date: 2018-04-03
武汉宜田科技发展有限公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The technical problem to be solved by the embodiments of the present invention is that, in view of the problem that the cleaning ability and biodegradability of the silicon wafer cleaning agent in the prior art cannot be unified, and a large amount of foam is produced during the cleaning process, and it is difficult to rinse, a degradable cleaning agent is proposed. Environment-friendly silicon wafer cleaning agent and preparation method thereof

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of easily degradable environment-friendly silicon wafer cleaning agent and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] 74 parts by weight of deionized water;

[0031] 22 parts by weight of surfactants, including 6 parts by weight of alkyl glucose amide, 4 parts by weight of isomeric alcohol polyoxyethyl ether, 4 parts by weight of alcohol ether carboxylate, 5 parts by weight of alkyl diphenyl ether disulfonate, chelating 3 parts by weight of active surfactant;

[0032] 2 parts by weight of alkali, specifically 2 parts by weight of potassium hydroxide;

[0033] 1.5 parts by weight of dispersant, specifically 1.5 parts by weight of acrylic acid homopolymer dispersant;

[0034] 0.5 parts by weight of a defoamer, specifically 0.5 parts by weight of a silicone-modified polyether defoamer.

[0035]When cleaning this kind of silicon wafer cleaning agent, according to the standard of 3% concentration of the prepared silicon wafer cleaning agent, add the above-mentioned silicon wafer cleaning agent and deionized water in the cleaning tank, and heat it to 55 degrees Celsius to start cleaning. ...

Embodiment 2

[0037] 76 parts by weight of deionized water;

[0038] 19 parts by weight of surfactant, including 5 parts by weight of alkylglucamide, 3 parts by weight of isomeric alcohol polyoxyethyl ether, 4 parts by weight of alcohol ether carboxylate, 4 parts by weight of alkyl diphenyl ether disulfonate, chelating 3 parts by weight of active surfactant;

[0039] 3 parts by weight of alkali, specifically 3 parts by weight of potassium hydroxide;

[0040] 1 part by weight of dispersant, specifically 1 part by weight of acrylic acid homopolymer dispersant;

[0041] 1 part by weight of the defoamer, specifically 1 part by weight of a silicone-modified polyether defoamer.

[0042] When cleaning this kind of silicon wafer cleaning agent, according to the standard of 3% concentration of the prepared silicon wafer cleaning agent, add the above-mentioned silicon wafer cleaning agent and deionized water in the cleaning tank, and heat it to 55 degrees Celsius to start cleaning. It can clean ab...

Embodiment 3

[0044] 83 parts by weight of deionized water;

[0045] 14 parts by weight of surfactant, including 4 parts by weight of alkylglucamide, 2 parts by weight of isomeric alcohol polyoxyethyl ether, 3 parts by weight of alcohol ether carboxylate, 3 parts by weight of alkyl diphenyl ether disulfonate, chelating 2 parts by weight of active surfactant;

[0046] 1.5 parts by weight of alkali, specifically 1.5 parts by weight of potassium hydroxide;

[0047] 1 part by weight of dispersant, specifically 1 part by weight of acrylic acid homopolymer dispersant;

[0048] 0.5 parts by weight of a defoamer, specifically 0.5 parts by weight of a silicone-modified polyether defoamer.

[0049] When cleaning this kind of silicon wafer cleaning agent, according to the standard of 3% concentration of the prepared silicon wafer cleaning agent, add the above-mentioned silicon wafer cleaning agent and deionized water in the cleaning tank, and heat it to 55 degrees Celsius to start cleaning. It can ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The embodiment of the present invention discloses an easily degradable and environment-friendly silicon chip cleaning agent and a preparation method thereof. The components of the easily degradable and environment-friendly silicon chip cleaning agent include 10-25 parts by weight of a surfactant, and 1-4 parts by weight of an alkali , the dispersant of 0.2-2 parts by weight, the defoamer of 0.5-2 parts by weight and the deionized water of 70-85 parts by weight. The implementation of the embodiment of the present invention has the following beneficial effects: the easily degradable and environmentally friendly silicon wafer cleaning agent of the present invention has strong cleaning ability, is easy to biodegrade, avoids harmful volatile organic compounds, and produces less foam.

Description

technical field [0001] The invention relates to the field of solar silicon wafer production, in particular to an easily degradable and environment-friendly silicon wafer cleaning agent and a preparation method thereof. Background technique [0002] During the production of solar silicon wafers, silicon ingots need to be cut into sheets. After the wire cutting is completed, spray washing and degumming are carried out to completely separate the silicon wafer from the glue layer. The surface of the degummed silicon wafer still has a lot of dirt attached, so the silicon wafer must be cleaned. When cleaning, it is necessary to use silicon wafer cleaning agent to clean solar silicon wafers. Silicon wafer cleaning agents currently on the market have inconsistent cleaning ability and biodegradability, and produce a lot of foam during the cleaning process, making it difficult to rinse. Contents of the invention [0003] The technical problem to be solved by the embodiments of th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C11D1/831C11D3/60C11D3/37C11D3/04
Inventor 洪育林张震李文文安冠宇张冠刘辉
Owner 武汉宜田科技发展有限公司