Substrate provided with metal layer and manufacturing method of substrate
A manufacturing method and metal layer technology, applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of high cost, poor insulation, poor precision, etc., and achieve the effect of improving product cost performance, improving production efficiency, and stabilizing the production process
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[0050]The preferred embodiments of the invention will be further described in detail below.
[0051] Such as Figures 1 to 3 Shown, a kind of manufacturing method of the substrate with metal layer, comprises the steps:
[0052] S1, sticking a first metal film on the first insulating film substrate 5 .
[0053] The first insulating film substrate 5 may be made of PET (polyethylene terephthalate, polyethylene terephthalate). In some embodiments, the first insulating film substrate 5 may have a hot-melt adhesive layer, and the hot-melt adhesive layer is adhered to the first metal film at high temperature. Common copper foil can be used for the metal film.
[0054] S2 , a cutting line may be cut on the first metal film by using a knife, and a dividing area is formed between adjacent dividing lines, and the dividing area includes a first dividing area 31 and a second dividing area 32 .
[0055] S3, separating the metal thin film strips on the divided region from the first metal...
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