A Circular Motion Method for Multiple Wafers Based on Multiple Exposure Programs

A cyclic motion, multi-exposure technology, applied in microlithography exposure equipment, photolithography process exposure devices, etc., can solve the problems of reducing the use efficiency of the machine, wasting machine time, consumption, etc., and reducing the time occupied by the machine. , reduce the size, reduce the effect of the exposure area

CN105093849BActive Publication Date: 2017-06-23SHANGHAI HUALI MICROELECTRONICS CORP
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Publication Date
2017-06-23

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Abstract

The invention discloses a multi-exposure-program based multi-silicon-wafer circulation movement method, comprising the following steps of firstly transferring a single silicon wafer in a silicon wafer box to a silicon wafer carrying table; next, performing circulation exposure on the silicon wafer transferred to the silicon wafer carrying table at a preset number of rounds; then transferring the silicon wafer after being circularly exposed back to the silicon wafer box; and finally performing circulation exposure on the next silicon wafer in the silicon wafer box with the preset number of rounds until all the silicon wafers in the silicon wafer box are circularly exposed. According to the multi-exposure-program based multi-silicon-wafer circulation movement method, by changing the circulation exposure sequences of the silicon wafers, the occupied time on the machine table in transferring the silicon wafers is reduced; meanwhile, the method has a better effect on taking away fine particles from ultra-pure water to enable the fine particles in the ultra-pure water to be accumulated on the single silicon wafer until reaching a saturation condition, so that the fine particles in the ultra-pure water is less and less; and meanwhile, by reducing the exposure area of the silicon wafers, the sizes of flatness result files produced by each exposure image can be reduced, so that the problem of machine table downtime caused by overlarge flatness result files is solved.
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Description

technical field

[0001] The invention belongs to the technical field of semiconductor photolithography technology, and relates to a multi-silicon wafer circular motion method based on multi-exposure programs. Background technique

[0002] In semiconductor technology, the essence of photolithography is to copy the temporary circuit structure to the silicon wafer that will be etched and ion-implanted later. Photolithography uses light-sensitive photoresist materials and controlled exposure to create three-dimensional patterns on the surface of silicon wafers.

[0003] An important performance indicator in lithography is the resolution of each pattern. To improve resolution, more advanced immersion lithography was developed. In traditional lithography technology, the medium between the projection lens of the lithography machine and the photoresist on the silicon wafer is air.

[0004] Immersion lithography refers to a new type of lithography that fills the gap between the pro...

Examples

Embodiment Construction

[0025] In order to make the purpose, technical solution and advantages of the present invention clearer, the following will further describe the implementation of the present invention in detail in conjunction with the accompanying drawings. Those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.

[0026] The above and other technical features and beneficial effects will be combined with the embodiments and the accompanying image 3 , 4 The multi-silicon wafer circular movement method based on the multi-exposure program of the present invention is described in detail. image 3 It i...