A Feedforward Control Method for Improving the Output Current Frequency of Electroplating Power Supply
A feedforward control and power output technology, applied in the direction of output power conversion devices, electrical components, etc., can solve the problems of long operation time, complex control method, long calculation delay of the feedforward control method, etc., to improve the response speed. and control accuracy, reducing complexity, increasing stability
Active Publication Date: 2017-12-01
XIAN XD ELECTRIC RES INST CO LTD +1
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Problems solved by technology
The complexity of its control is high and the overhead is large
The second is that the inconsistent load current and inductor current need to be processed through the set current normalization module, which needs to be matched and normalized, and the calculation time of the feedforward control method is long
The fourth is that it is necessary to calculate the error signal to correlate the feedforward control signals of the primary side and the secondary side. The control method is complicated and the calculation delay is long.
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[0031] The present invention will be further described in detail below in conjunction with specific embodiments, which are explanations of the present invention rather than limitations.
[0032] The present invention provides a feedforward control method for increasing the output current frequency of an electroplating power supply. In the method, a given reference current signal is added to a feedback signal through a feedforward channel, and the reference current signal is sent to the input terminal of the PWM link in advance. to offset the delay of the feedback signal. In this way, the system greatly improves the response speed of the electroplating power supply, thereby increasing the output current frequency of the electroplating power supply. This method has a good control effect on the output pulse waveform with adjustable pulse width. Such as figure 1 and figure 2 As shown, it includes the following steps,
[0033] (1) Calculate the feedforward regulator D under th...
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The present invention provides a feedforward control method for improving an output current frequency of a plating power supply. The feedforward control method comprises the following steps: (1) performing initialization, and calculating a feedforward regulator in a no feedback condition; (2) inputting a reference signal after a timer in the plating power supply is interrupted, and obtaining a feedforward output signal through the feedforward regulator; (3) acquiring output current and subjecting the output current to the transfer function of a feedback channel and the transfer function Gc(s) of a feedback regulator so as to obtain the output signal of the feedback regulator; (4) adding the feedforward output signal df and the output signal db of the feedback regulator to obtain an input signal of a PWM link, and obtaining a duty cycle; and (5) controlling the transfer function of a main loop through the duty cycle, and completing the feedforward control of the output current of the plating power supply. A given reference current signal is added to the feedback signal through the feedforward channel to obtain a control signal, then the control signal is sent to the input end of the PWM link, and the reference current signal is sent in advance to the input end of the PWM link through the feedforward channel so as to offset the delay of the feedback signal.
Description
technical field [0001] The invention relates to the control field of electroplating power supply, in particular to a feedforward control method for increasing the output current frequency of the electroplating power supply. Background technique [0002] Electroplating is a very important traditional industry with a long history, and high-frequency power supply is a very promising research field. Since electroplating is to uniformly cover metal ions on the surface of the material to be plated, only a power supply with a higher power frequency can electroplate more uniformly. Considering the difference in thickness, location and density of electroplating, it is necessary to change the magnitude of the electroplating current at any time. [0003] The research on the output current of electroplating power supply is of great significance to the development of electrochemical industry. Usually, the electroplating power supply controlled by an analog chip can only output a curren...
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IPC IPC(8): H02M1/00
Inventor 贺俊李侠王弋飞裴云庆
Owner XIAN XD ELECTRIC RES INST CO LTD