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Preparation method of photonic crystal scintillator by using polymer template

A photonic crystal and scintillator technology, applied in the field of nuclear radiation detection, can solve the problems affecting the overall structure stability, adverse light extraction efficiency, reduction of refractive index contrast, etc., achieves favorable light extraction efficiency, easy to prepare large area Structure, low cost effect

Inactive Publication Date: 2016-02-24
TONGJI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the photonic crystals prepared by this method may contain polymer microspheres. In long-term radiometric applications, the properties of polymers will cause serious radiation damage, such as the appearance of color centers that cause additional light self-absorption, or produce

Method used

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  • Preparation method of photonic crystal scintillator by using polymer template
  • Preparation method of photonic crystal scintillator by using polymer template

Examples

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Embodiment 1

[0033] In this example we will be at (Lu,Y) 2 SiO 5 : Prepare a photonic crystal structure on the surface of Ce scintillator, the scintillator luminescence center wavelength is 420nm, choose polystyrene microspheres with a diameter of 500nm (mass percentage is 2.5%, purchased by Sigma company). (Lu,Y) to be purchased from Sikas 2 SiO 5 : The Ce scintillator is cut and polished into a scintillator substrate with an area of ​​10mmX10mm and a thickness of 1mm.

[0034] 1. Microsphere array preparation.

[0035] (1) Wafer processing. A 10% sodium dodecyl methyl sulfate solution was prepared, and the silicon wafer was put into the solution for 24 hours.

[0036] (2) Preparation of polystyrene microsphere solution. Take a certain amount of polystyrene microsphere solution and absolute ethanol, and mix them in a ratio of 1:1.

[0037] (3) Drop the prepared polystyrene microsphere solution onto the treated silicon wafer, wait for it to fully unfold on the silicon wafer, and com...

Embodiment 2

[0044] In this example we will be at Bi 4 Ge 3 o 12 A photonic crystal structure was prepared on the surface of the scintillator. The central wavelength of the scintillator light emission was 520nm, and polymethyl methacrylate microspheres with a diameter of 600nm (2.5% by mass, purchased from Sigma Company) were selected. Bi to be purchased from Sikas 4 Ge 3 o 12 The scintillator is cut and polished into a scintillator substrate with an area of ​​20mm×20mm and a thickness of 3mm.

[0045] 1. Microsphere array preparation.

[0046] (1) Wafer processing. A 5% sodium dodecyl methyl sulfate solution was prepared, and the silicon wafer was put into the solution for 12 hours.

[0047] (2) Preparation of polymethyl methacrylate microsphere solution. Take a certain amount of polymethyl methacrylate microsphere solution and absolute ethanol, and mix them in a ratio of 1:1.

[0048] (3) Drop the prepared polymethyl methacrylate microsphere solution onto the treated silicon waf...

Embodiment 3

[0055] A kind of method utilizing polymer template to prepare photonic crystal scintillator, adopts following steps:

[0056] (1) Preparation of polymer microsphere array on scintillator surface:

[0057] (1-1) Treating silicon wafers: preparing a sodium dodecyl methylsulfate solution with a concentration of 8 wt%, and placing the silicon wafers in it for 18 hours;

[0058] (1-2) Prepare the polymer microsphere solution: mix the polystyrene microsphere solution with a concentration of 2.5-5wt% and absolute ethanol at a volume ratio of 1:1;

[0059] (1-3) Drop the polymer microsphere solution onto the treated silicon wafer, and wait until it is fully developed on the silicon wafer and the moisture is completely volatilized;

[0060] (1-4) Slowly put the silicon chip dripped with the polymer microsphere solution into the deionized water, the polymer microsphere array will be separated from the silicon chip, and float on the water surface to form a single-layer microsphere array...

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Abstract

The invention relates to a preparation method of a photonic crystal scintillator by using a polymer template. The preparation method comprises four steps of preparation of a polymer microballoon array on the surface of the scintillator, reactive ion beam etching, coating of a cover layer, and removal of the microballoon to prepare and obtain a corresponding photonic crystal with an inverse opal structure of a medium material, that is to say to obtain a transparent medium with high refractive index and hexagonal periodical hole structure on the surface of the scintillator. Compared with the prior art, the photonic crystal prepared by the invention has large area and large refractive index contrast, has no polymer component, can guarantee enough light extraction efficiency, and can guarantee enough anti-radiation performance in the nuclear radiation environment.

Description

technical field [0001] The invention belongs to the field of nuclear radiation detection, in particular to a method for preparing a photonic crystal scintillator by using a polymer template. Background technique [0002] Scintillation detection systems have important applications in nuclear physics experiments, high-energy physics experiments, nuclear medical imaging, security inspections, astrophysics, and cosmic ray detection, and are an important method for detecting high-energy rays and particles. The core functional material in the system is the scintillator, which absorbs the energy of nuclear radiation and converts it into visible light or near-ultraviolet light. The properties of the scintillator strongly influence the detection capability of the detection system. [0003] Since most inorganic scintillators have a high refractive index (n=1.8-2.5), the luminescence inside the scintillator will produce serious internal total reflection phenomenon at the exit interfac...

Claims

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Application Information

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IPC IPC(8): C30B29/22C30B29/60
Inventor 刘波程传伟顾牡陈鸿陈亮刘金良欧阳晓平
Owner TONGJI UNIV
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