Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A partitioned mems fuze

A partition type fuze technology, applied in the direction of fuzes, weapon accessories, offensive equipment, etc., can solve problems such as breakthroughs and constraints on technological development, and achieve the effects of increasing yield, high degree of intelligence, and reducing production costs

Active Publication Date: 2017-03-01
XI AN JIAOTONG UNIV
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] With the advancement of weapon technology, fuzes need to develop in the direction of miniaturization, integration and intelligence, and it is difficult for traditional processing techniques to make breakthroughs in small-scale processing, which will restrict the development of related technologies

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A partitioned mems fuze
  • A partitioned mems fuze
  • A partitioned mems fuze

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0021] The present invention will be further described below in conjunction with the accompanying drawings.

[0022] refer to figure 1 , a partition type MEMS fuze, including agent cover layer I, agent layer II, security device layer III and acceleration chamber layer IV, the upper part of agent layer II and agent cover layer I are connected by bonding, and the lower part of agent layer II It is connected with the upper part of the security device layer III by bonding, and the lower part of the security device layer III is pasted with the acceleration chamber layer IV.

[0023] refer to figure 2 , the drug cover layer I includes a drug cover 23, the drug cover 23 is a square sheet of single crystal silicon material with a side length of 7.5mm-8mm and a thickness of 0.2mm-0.3mm.

[0024] refer to image 3 , the drug layer II includes a drug layer wall 20, the drug chamber 22 is located below the center of the drug layer wall 20, and is used to fill the priming agent, the de...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A partitioned MEMS fuze, including a drug layer, the upper part of the drug layer and the drug cover layer are connected by bonding, the lower part of the drug layer and the upper part of the security device layer are connected by bonding, and the lower part of the security device layer is bonded to the acceleration chamber layer. Paste, the security device layer includes a silicon substrate layer, a silicon dioxide layer and a movable silicon structure layer are sequentially fabricated on the silicon substrate layer, and four groups of drivers are fabricated in the movable silicon layer, and the right and left metal electrodes of each group of drivers are respectively Made on the right and left anchor points, the two ends of the V-shaped thermoelectric actuators in an array are connected to the left and right anchor points respectively, the head end of the lever is connected to the middle arm through the right flexible beam, and the lower anchor point is connected to the middle arm through the left flexible beam. The first ends of the levers are connected, and the partition is located at the end of the lever and is made with interlocking grooves and interlocking teeth, which form interlocking with the interlocking teeth and interlocking grooves corresponding to the adjacent partitions. The present invention applies MEMS technology to the fuze, It has the characteristics of low cost, high intelligence and easy integration.

Description

technical field [0001] The invention relates to the technical field of fuzes, in particular to an isolated MEMS fuze. Background technique [0002] The fuze is an important part of the weapon system. It detects the environment and targets to obtain information, process and identify information, and realizes the safety state control and optimal detonation control of the fuze. In order to achieve the above goals, a corresponding partition mechanism is usually designed to prevent accidental detonation and improve the safety performance of the fuze. [0003] With the advancement of weapon technology, fuzes need to develop in the direction of miniaturization, integration, and intelligence. However, it is difficult for traditional processing techniques to make breakthroughs in small-scale processing, which will restrict the development of related technologies. Applying MEMS technology to the design of the fuze will solve this contradiction well. MEMS fuze has many advantages suc...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): F42C15/00
CPCF42C15/00
Inventor 赵玉龙胡腾江李秀源白颖伟
Owner XI AN JIAOTONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com