Method of using extrapolation to acquire far field RCS possessing multiple scattering objects

A technology of multiple scattering and pushing method, applied in radio wave measurement systems, instruments, etc., can solve problems such as performance degradation and large errors, and achieve high-precision results

Inactive Publication Date: 2016-05-11
NORTHWESTERN POLYTECHNICAL UNIV
View PDF5 Cites 19 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to overcome the extrapolation method proposed for the isolated point scattering center model, the performance is degraded when calculating complex coupling targets, and the problem of large errors is brought

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method of using extrapolation to acquire far field RCS possessing multiple scattering objects
  • Method of using extrapolation to acquire far field RCS possessing multiple scattering objects
  • Method of using extrapolation to acquire far field RCS possessing multiple scattering objects

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0027] refer to figure 2 -a Select a straight dihedral structure model with a side length of 0.5m, the test frequency is 1.645GHz, and the wavelength is 0.1824m. According to the near-field measurement condition R≤2D 2 / λ=5.5m, where is the maximum size of the target, so the near-field distance is selected as R=2m during the simulation. Specific steps are as follows:

[0028] 1) Use the electromagnetic simulation software FEKO to model and simulate the straight dihedral angle model, and collect near-field bistatic scattering data on the azimuth plane at a distance of R=2m from the target to be measured. The antenna transmits at a certain point while receiving at intervals of 1° on the circumference far from the target R. By analogy, the antenna performs "single transmission and multiple collection" collection point by point on the circumference in turn, so as to obtain complete near-field dual-station data, denoted as E NN (θ tN ,θ rN ).

[0029] 2) The near-field da...

example 2

[0036] refer to figure 2 -b Choose a straight cavity structure model with a length of 0.68m, a width of 0.61m, and a height of 0.44m. The test frequency is 1.5GHz and the wavelength is 0.2m. According to the near-field measurement condition R≤2D 2 / λ=4.6m, where D=0.68m is the maximum size of the target, and the near-field distance is selected as R=2m during simulation. Carry out the simulation according to the same steps in Example 1, and the obtained extrapolation results refer to Figure 4 , compared with the far-field RCS of the cavity, the coincidence degree of the two is also very high, and the average error in the coupling area is 0.38dB. The effectiveness of the method is verified.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a near field scattering extrapolation method based on near-field complete double station information. The method is characterized that extrapolation processing is performed on near field scattering data collected under each angle after near-field double station scattering information of an object full angle domain is acquired; then according to a reciprocal theory, extrapolated data is equivalent to ''far field emission and near field receiving'' data; and then extrapolation is performed on the data so that the data satisfies a ''far field emission and far field receiving'' condition; and finally, an element on a diagonal line is removed and a far field RCS of each angle is acquired.

Description

technical field [0001] The invention relates to a near-field-far-field radar cross-section (RCS) extrapolation method, in particular to a near-far field conversion processing method for objects with multiple scattering, and belongs to the field of scattering measurement. Background technique [0002] The document "Animproved image-based circular near-field to far-field transformation, IEEE Transactions on antennas and propagation, 2013, 61(2), p989-993" discloses the principle of RCS (Radar Cross Section) extrapolation technology based on synthetic aperture imaging, which assumes the spatial reflectivity of the target The distribution function is not affected by changes in irradiation conditions and is an objective characteristic of the target itself. Based on this approximation, the extrapolation technique can be applied to occasions where bi-station information is not required. The target scattering rate distribution can be obtained through ISAR imaging to determine the ta...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01S7/41
CPCG01S7/41
Inventor 李南京党娇娇胡楚锋陈卫军徐志浩
Owner NORTHWESTERN POLYTECHNICAL UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap