Automatic photoetching plate cleaning machine
A technology of photolithography plate and cleaning machine, which is applied in the direction of electrical components, semiconductor/solid-state device manufacturing, circuits, etc. It can solve problems such as sticking dust, affecting photolithography effect, and device performance degradation, achieving high cleanliness and process effect Ideal, highly automated results
Inactive Publication Date: 2016-05-18
SHAANXI SHENGMAI PETROLEUM
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Problems solved by technology
If the photolithography plate is not clean and there are contaminating particles, these particles will be copied to the photoresist on the surface of the silicon wafer, resulting in a decrease in device performance
However, dust, photoresist and other pollutants will inevitably stick to the photolithography plate during use, and the existence of these pollutants directly affects the effect of photolithography.
Method used
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Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0013] A fully automatic photolithographic plate cleaning machine, comprising a loading and unloading unit, a cleaning unit, a turning unit, a photolithographic plate transmission unit, a positioning unit, a liquid medicine supply and circulation unit, and a temperature control unit.
[0014] Wherein, the loading and unloading unit includes a cassette A and a cassette B for carrying the photoresist plates to be cleaned and cleaned. The photoresist plate transfer unit grabs the photoresist plate to be cleaned from the loading and unloading unit, puts it into the cleaning unit for cleaning, and puts it back into the loading and unloading unit after the processing is completed. The specific functions of cassette A and cassette B can be set arbitrarily by software.
[0015] The cleaning unit is a closed chamber. The structure in the chamber is: a chuck that carries the rotation of the photolithography plate; it is equipped with liquid medicine nozzles, brushes, megasonic nozzles, ...
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The invention relates to the field of cleaning of a photoetching plate, and specifically relates to an automatic photoetching plate cleaning machine. The automatic photoetching plate cleaning machine is composed of a feeding and discharging unit, a cleaning unit, an overturn unit, a photoetching plate transmission unit, a positioning unit, a medicine liquid supply and circulation unit and a temperature control unit. The automatic photoetching plate cleaning machine provided by the invention has the following advantages: the application is convenient, the cleanliness is high after the machine is used for cleaning, the technical effect is ideal, the technical parameters are stable, the automation degree is high, and the batch processing capability is high. Therefore, the automatic photoetching plate cleaning machine can be widely applied to industrial production.
Description
technical field [0001] The invention relates to the field of cleaning photoresist plates, in particular to a fully automatic photoresist plate cleaning machine. Background technique [0002] Photolithography is a key process in the manufacture of semiconductor devices and integrated circuit micropattern structures. The process quality directly affects the device yield, reliability, device performance and service life and other parameters. The photomask is an important link in the photolithography process. The photolithography plate must be very clean, and all the circuit components on the silicon wafer come from the layout. If the photolithography plate is not clean and there are contaminating particles, these particles will be copied to the photoresist on the surface of the silicon wafer, resulting in a decrease in device performance. However, dust, photoresist and other pollutants will inevitably stick to the photolithography plate during use, and the existence of these ...
Claims
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Inventor 王耀斌
Owner SHAANXI SHENGMAI PETROLEUM