A Combined Method of Atomic Force Microscopy and Surface Photovoltage Spectroscopy

A technology of surface photovoltage spectroscopy and atomic force microscopy, applied in scanning probe microscopy, instruments, measuring devices, etc., can solve the problems of surface photovoltage spectrum limitation, lack of spatial resolution and unobtainable surface photovoltage spectrum

Active Publication Date: 2019-02-01
DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the surface photovoltage spectrum lacks spatial resolution, especially when studying the above problems, it involves the distribution of charges in the range of nanometers and micrometers, and the application of surface photovoltage spectroscopy is greatly limited.
The atomic force microscope can obtain nanometer-resolution spatial information, and can also obtain nanometer-resolution electrical signals, such as surface potential, capacitance, etc., but the atomic force microscope itself cannot obtain the information of these signals changing with the excitation wavelength

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A Combined Method of Atomic Force Microscopy and Surface Photovoltage Spectroscopy
  • A Combined Method of Atomic Force Microscopy and Surface Photovoltage Spectroscopy
  • A Combined Method of Atomic Force Microscopy and Surface Photovoltage Spectroscopy

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach

[0018] 1 BiVO 4 The particles were fixed on the FTO conductive glass by spin coating, and washed with ethanol and secondary water in sequence. Dry on a hot table at 70°C;

[0019] 2. Turn on the atomic force microscope and scan the shape first to find the particles to be tested. Select the area to be tested and continuously narrow the scanning range until the scanning range approaches 0 nanometers;

[0020] 3 Open the atomic force surface potential output interface, and set the output signal on the front panel of the atomic force controller to electric potential. Input this signal to the signal input terminal of the lock-in amplifier;

[0021] 4 Turn on the monochromator, turn on the xenon lamp, and select 380 nm as the initial scanning wavelength.

[0022] 5 Turn on the chopper, set the frequency to 6 Hz, and input the chopper frequency signal to the lock-in amplifier;

[0023] 6 Connect the amplitude and phase signals obtained by the lock-in amplifier to the data acquis...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a method for combining an atomic force microscope and a surface photovoltage spectrum, which is used for measuring the surface photovoltage spectrum of a micro-region on a semiconductor surface, and solves the problem that the surface photovoltage spectrum does not have spatial resolution capabilities. The atomic force microscope and the spectrometer can be modulated by a chopper. The variable optical wavelength signal, the surface potential change and the lock-in amplifier are combined to give the surface photovoltage spectrum and phase angle resolution spectrum of the semiconductor micro-region.

Description

technical field [0001] The invention relates to a combined method of atomic force microscope and surface photovoltage spectrum, which is applicable to the surface photovoltage spectrum measurement of micron and nanometer regions on the surface of semiconductor particles. Background technique [0002] Photocatalytic water splitting to produce hydrogen is an important way to develop and utilize solar energy. For solar hydrogen and CO 2 Due to the great demand for reduction, people are developing a series of synthesis methods and assembly strategies for photocatalytic materials, including the modification of nanostructures on the surface of semiconductor catalysts, the directional synthesis of crystal planes, the synthesis of low-dimensional structures, and the construction of heterojunctions / heterojunctions The assembly strategy of co-catalyst and co-catalyst improves the efficiency of photoelectrocatalytic water splitting to a certain extent. However, so far, people's under...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G01Q60/24
Inventor 李灿朱剑范峰滔安虹宇陈若天
Owner DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products