Mask group suitable for multi-overlay multi-time sequence photoetching pattern and fabrication method of mask group
A photolithographic pattern and mask technology, which is applied to the photoengraving process of the pattern surface, the original for optical mechanical processing, optics, etc. Micro-machining flexibility and other issues, to achieve the effect of facilitating the processing process, saving the quantity and reducing the cost
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[0027] The specific embodiments of the present invention will be described in further detail below in conjunction with the drawings and embodiments. The following examples are used to illustrate the present invention, but not to limit the scope of the present invention.
[0028] Embodiment 1 of the present invention provides a mask set suitable for multiple time sequence lithography patterns for multiple engraving, including multiple masks, the number of masks is m+1, and m is the number of engravings, among them,
[0029] Each mask plate is evenly divided into a plurality of pattern areas, the total area of the pattern areas is equal to the surface area of the mask plate, and the number of pattern areas is at least m+1. If in order to highlight the diversification of the mask processing sequence, each mask is evenly divided A pattern area, m is the number of over-engraving.
[0030] Each pattern area is provided with a light-shielding layer, the light-shielding layer is provi...
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