Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Roof type photovoltaic array pitch optimizing method based on shadow radiation analysis

A photovoltaic array, radiation analysis technology, applied in special data processing applications, instruments, electrical digital data processing, etc., can solve problems such as unconsidered, achieve benefits, reduce static investment, and shorten the payback period.

Inactive Publication Date: 2016-07-13
嘉兴国电通新能源科技有限公司 +2
View PDF6 Cites 18 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this invention proposes a comprehensive calculation method to reasonably determine the module inclination angle and array spacing with the goal of maximizing power generation benefits, in the process, it has not considered the installation of rooftop photovoltaic equipment in the case of limited fixed sites.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Roof type photovoltaic array pitch optimizing method based on shadow radiation analysis
  • Roof type photovoltaic array pitch optimizing method based on shadow radiation analysis
  • Roof type photovoltaic array pitch optimizing method based on shadow radiation analysis

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0049] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0050] A method for optimizing the spacing of rooftop photovoltaic arrays based on shadow radiation analysis, such as figure 1 shown, including the following steps:

[0051] (1) Obtain the building model and the geographic location attribute of the building model.

[0052] In this embodiment, the BIM software is used to obtain the building information model and the corresponding geographic location attributes. The building model is as follows: figure 2 As shown, the geographic location of the building information model is 120.76° east longitude and 30.07° north latitude.

[0053] (2) Perform shadow analysis on the area to be laid.

[0054] The roof of the building is selected as the area to be paved, and shadow analysis is performed on it. The shadow analysis results are as follows: image 3 shown. image 3 Medium-dark areas are unoccluded areas, ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a roof type photovoltaic array pitch optimizing method based on shadow radiation analysis.The roof type photovoltaic array pitch optimizing method based on shadow radiation analysis comprises the steps that firstly, a building model and geographic position attributes of the building model are obtained; secondly, according to the geographic position attributes of the building model, a laying area of photovoltaic equipment is determined; thirdly, according to the geographic position attributes of the building model and parameters of the photovoltaic equipment, an installation pitch initial value of a photovoltaic array is calculated; fourthly, a static investment target function for unit electric energy is established; fifthly, the photovoltaic array pitch is adjusted to make the static investment of unit electric energy be minimum, and the photovoltaic array pitch with the minimum static investment of unit electric energy is the actual laying pitch of the photovoltaic equipment.By means of the optimizing method, more photovoltaic equipment is laid in a limited area by adjusting the photovoltaic array pitch, the total electricity generating amount is increased, and the static investment of unit electric energy is reduced.

Description

technical field [0001] The invention relates to the field of photovoltaic technology, in particular to a method for optimizing the spacing of rooftop photovoltaic arrays based on shadow radiation analysis. Background technique [0002] In order to reduce the energy consumption of buildings and promote the on-site use of photovoltaic new energy, researchers have proposed the idea of ​​photovoltaic building integration. By combining buildings with photovoltaics, buildings have changed from simple electricity consumers to electricity generation and utilization complexes. The integration of photovoltaics and buildings not only reduces the waste of land resources, but also generates electricity locally and consumes electricity locally, which greatly improves the utilization efficiency of photovoltaic power generation. [0003] The surface form of the building is complex, with different photovoltaic laying surfaces such as flat, vertical, and inclined surfaces. The calculation of...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F17/50
CPCG06F30/367
Inventor 桂宁董彦松储学立
Owner 嘉兴国电通新能源科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com