SiHCl3 synthetic tail gas treatment device

Abstract

The invention belongs to the field of SiHCl3 treatment devices and relates to SiHCl3 synthetic tail gas treatment equipment, in particular to a SiHCl3 synthetic tail gas treatment device.The SiHCl3 synthetic tail gas treatment device comprises a bearing device.The bearing device comprises a bearing shell, a second adsorption device is arranged above the bearing device, and a first adsorption device is arranged between the second adsorption device and the bearing device.Due to the fact that the first adsorption device is arranged between the second adsorption device and the bearing device, an adsorption plate is arranged in the first adsorption device, a rack wheel is arranged outside the first adsorption device, a drive mechanism is arranged on the rack wheel, the first adsorption device can well adsorb and filter solid silica dust and high-boiling residue dust in gas in the first adsorption device, the solid silica dust and the high-boiling residue dust in the gas can be well filtered out, and pure gas, pure solid silica dust and pure high-boiling residue dust can be obtained, utilized and recovered.

Description

Technical field [0001] The invention belongs to the field of trichlorosilane treatment equipment, relates to a trichlorosilane synthesis tail gas treatment device, in particular to a trichlorosilane synthesis tail gas treatment device. Background technique [0002] Trichlorosilane (SiHCl 3 ) Is a widely used organic silicon monomer. It is a raw material for manufacturing solar-grade and electronic-grade polysilicon and semiconductor-grade monocrystalline silicon. It is also the basic monomer for the synthesis of a variety of organic silicon. With the advancement of science and technology, the fields of fine chemicals, new energy, optoelectronics and communications have developed rapidly, and there is an increasing demand for silicon and various silicon-containing products, especially those made from trichlorosilane as raw materials or intermediate products. The products obtained are more and more favored by today's silicon industry. [0003] Trichlorosilane is obtained by the gas-...

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Problems solved by technology

[0009] Each component in the synthesis tail gas has a high reuse value. In the prior art, the HCl and hydrolyzed chlorosilane are only neutralized by alkali treatment, and the unreacted solid silicon dust and the tail gas are not recovered and reused. high boiling matter dust, resulting in waste of raw materials

At the same time, the alkali treatment method uses a large amount of alkali, and has high requirements on the process parameters and performance of the equipment, which increases the cost of tail gas treatment.

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