Adjustment platform for microarray dotting processing

Abstract

The invention discloses an adjustment platform for microarray impact point processing, which includes a lower slide, an upper slide, elastic parts and connecting pieces, and the connecting pieces are arranged in multiples and evenly arranged on the contour of the upper slide above; the upper sliding platform is set on the lower sliding platform, the elastic member is arranged between the lower sliding platform and the upper sliding platform, and the two ends of the elastic member press the lower sliding platform and the upper sliding platform respectively. platform; a first threaded hole is opened on the lower platform, and a through hole corresponding to the position of the first threaded hole is opened on the bottom surface of the upper sliding platform, and the connecting piece passes through the through hole to connect with the first threaded hole. A threaded hole for threaded connection. In the present invention, when the upper surface of the upper sliding table is inclined, it can be tightened or loosened through the connecting piece, and then the upper sliding table moves upward or downward under the action of the elastic piece and the connecting piece, so that the upper sliding table The upper surface is in a horizontal state, thereby realizing the levelness adjustment of the upper slide table, and has the beneficial effects of simple structure, convenient adjustment and high precision.

Description

technical field [0001] The invention relates to an adjustment platform, in particular to an adjustment platform for microarray impact point processing. Background technique [0002] The light guide plate mold is an ultra-precision part. There are micro-arrays in the light guide plate mold. These micro-arrays are formed by the ultra-precision impact machine. Since the depth of the holes in the micro-array is only a few microns, it is necessary to make To maintain consistency and small errors in the processing depth of the hole, the platform needs to have extremely high flatness and levelness. Due to the unreasonable design of the existing light guide plate mold processing platform, the level adjustment of the platform is cumbersome, time-consuming and poor in accuracy, which greatly affects the processing quality and efficiency of the light guide plate mold. Contents of the invention [0003] The purpose of the present invention is to solve the problem that the existing li...

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to solve the problem that the existing light guide plate mold processing platform is unreasonable in design, the level adjustment of the platform is cumbersome, time-consuming and poor in accuracy, which greatly affects the processing quality and efficiency of the light guide plate mold, and provides a An adjustment platform for processing microarray collision points with simple structure, convenient adjustment and high precision

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