Measuring device
A technology for measuring devices and measuring directions, which is applied in measuring devices, optical devices, exposure devices for photolithography, etc., can solve the problems of production rate, control strategy and measurement accuracy, and meet the requirements of improving measurement stability and space Reduced effect
Inactive Publication Date: 2016-11-23
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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This switching can have serious impacts on productivity, control strategies and measurement accuracy
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[0022] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0023] A lithography machine usually includes an exposure system 4 and a workpiece table 5 . The exposure system 4 is placed on the main substrate 3 , and the workpiece table 5 is located below the exposure system 1 . Such as figure 1 and 2 As shown, the present invention uses a measurement system combining two sensors for position measurement. The measuring device of the present invention is composed of a sensor 1, a sensor 2 and a reference bracket 6, the sensor 1 and the sensor 2 are fixed on the reference bracket 6, and the reference bracket 6 can move along the measurement direction. In this embodiment, the measurement direction is the Y direction, and A drive mechanism 8 drives the reference support 6 to move in this direction. The sensor 1 is a relative position measurement sensor, such as a laser interferometer, used to measure the ...
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The invention discloses a measuring device which is used for measuring the position of a workpiece table of a mask aligner. The mask aligner comprises an exposure system and the workpiece table; the exposure system is positioned on a main base plate; the workpiece table is positioned below the exposure system; the measuring device is characterized by comprising a first sensor, a second sensor, a reference bracket and a grating ruler; the first sensor and the second sensor are fixed on the reference bracket; the grating ruler is arranged on the main base plate; the reference bracket drives the first sensor and the second sensor to move in the same direction as the workpiece table, wherein the movement direction is the measurement direction of the first sensor and the second sensor; the first sensor measures the position relationship between the reference bracket and the workpiece table; the second sensor measures the position of the reference bracket relative to the main base plate through the combination with the grating ruler; the position of the workpiece table relative to the main base plate is obtained through two measurement results. Compared with the prior art, the requirement of the measuring device on space is reduced; the sensors are not required to be switched during a normal using process; the measurement stability can be improved effectively.
Description
technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to a device for measuring the position of a workpiece table of a lithography machine. Background technique [0002] Laser interferometer is a commonly used measurement system for photolithography machine workpiece stage and mask stage. With the improvement of key indicators such as overlay and line width, the defects of laser interferometers that are susceptible to environmental influences are gradually exposed. [0003] Towards Ultimate Optical Lithography with NXT: 1950i Dual Stage Immersion Platform (SPIE Proceedings, Volume 7640). A grating measurement system is disclosed, which arranges a plane grating on the main substrate, and arranges a measurement sensor (grating reading head) on the workpiece table , since the distance between the sensor and the grating ruler is only 15mm, this method can effectively reduce the influence of the environment on the ...
Claims
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IPC IPC(8): G03F7/20G01B11/00
Inventor 单世宝
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD