An interferometer error calibration device and calibration method

Abstract

The invention discloses an interferometer error calibrating device for calibrating position errors of an interferometer. The interferometer error calibrating device comprises an X-direction photoelectric sensor, a Y-direction photoelectric sensor and a photoelectric sensor processing circuit. The X-direction photoelectric sensor comprises at least one photoelectric sensor located on one plane, and the Y-direction photoelectric sensor comprises at least one photoelectric sensor located on the other plane. The plane where the X-direction photoelectric sensor is located is perpendicular to the plane where the Y-direction photoelectric sensor is located. The photoelectric sensor processing circuit is used for converting photoelectric signals detected by the X-direction photoelectric sensor and the Y-direction photoelectric sensor into position information, and calculating the position errors of the interferometer according to the position information. The invention meanwhile discloses an interferometer error calibrating method.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to an interferometer error calibration device and calibration method. Background technique [0002] In lithography equipment, the positioning accuracy of the moving stage not only affects the accuracy of the exposure position during the exposure process, but also affects the repeatability of the alignment system. Since the position measurement of the moving table usually uses a laser interferometer, and for the laser interferometer measurement system, the laser is greatly affected by the environment such as temperature and pressure. The direction of propagation will then change, resulting in a measurement error in position. Especially when the stroke of the test bench is large, it is difficult for the ambient air bath to control the temperature and pressure in the whole stroke, and as the distance between the two measuring axes of the interferometer increas...

AI Technical Summary

Problems solved by technology

Since the position measurement of the moving table usually uses a laser interferometer, and for the laser interferometer measurement system, the laser is greatly affected by the environment such as temperature and pressure. The direction of propagation will change, resulting in a measurement error in position

Especially when the stroke of the test bench is large, it is difficult for the ambient air bath to control the temperature and pressure in the whole stroke, and as the distance between the two measuring axes of the interferometer increases, the two measuring axes are affected by the environment there are also differences

At present, in the integration process of the lithography machine, only the installation error of the interferometer, such as Abbe error and cosine error, has been calibrated, but the factors affected by the environment of the interferometer cannot be measured in real time

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