ito etching solution preparation system

An etching solution and mixing technology, which is applied to surface etching compositions, chemical instruments and methods, etc., can solve the problems of low degree of automation, poor material mixing effect, and insufficient product preparation accuracy, and achieve good mixing effect. , to ensure the effect of product accuracy

Active Publication Date: 2018-05-11
ZHEJIANG SHINING ELECTRONICS MATERIALS CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In existing FeCl 3 In the preparation process of ITO etching solution, it is generally operated manually, the degree of automation is low, the mixing effect of materials is poor, and the precision of product preparation is not enough

Method used

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  • ito etching solution preparation system

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Embodiment Construction

[0012] The present invention will be further described below in conjunction with specific drawings.

[0013] Such as figure 1 As shown: the ITO etching solution preparation system includes a mixing tank 1, a dissolution tank 2, a pumping circulation pump 3, a weighing scale 4, a first feeding port 5, a pumping pipe 6, and a second feeding port 7 , The first pipeline 8, the second pipeline 9, the sampling valve 10, the return pipeline 11, the regulating valve 12, the pressure gauge 13, the liquid level gauge 14, etc.

[0014] Such as figure 1 As shown, the ITO etching solution preparation system of the present invention includes a mixing tank 1, a dissolving tank 2 and a pumping circulation pump 3, the top of the mixing tank 1 is provided with a first feed port 5, and the outlet of the dissolving tank 2 The feed port is connected to the second feed port 7 on the top of the mixing tank 1 through the pumping pipe 6, and one end of the pumping circulating pump 3 is connected to ...

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Abstract

The invention relates to an ITO (Indium Tin Oxide) etching liquid preparation system which is characterized by comprising a blending tank, a dissolution tank and a sucking circulation pump, wherein a first feeding hole is formed in the top of the blending tank; the discharge hole of the dissolution tank is connected with a second feeding hole in the top of the blending tank through a sucking tube; one end of the sucking circulation pump is connected with the bottom of the blending tank through a first pipeline; the outlet end of the sucking circulation pump is connected with the second feeding hole of the blending tank, and a second pipeline respectively; filtering filling equipment is connected with the output end of the second pipeline; a sampling branch is arranged at the discharge end of the sucking circulation pump; a sampling valve is arranged on the sampling branch; a backflow pipeline is connected between the top of the blending tank and the output end of the second pipeline; an adjusting valve is arranged on the backflow pipeline; a third pipeline is connected in the middle of the blending tank; the third pipeline is connected with a discharge end pipeline of the sucking circulation pump, and a dissolution bucket; a weighing scale is mounted at the bottom of the dissolution bucket. The ITO etching liquid preparation system is high in automation degree and good in blending effect, and product precision can be ensured.

Description

technical field [0001] The invention relates to a preparation system, in particular to an ITO etching solution preparation system, which belongs to the technical field of chemical equipment. Background technique [0002] Indium tin oxide (ITO) conductive film has many advantages such as low resistivity, good light transmission, good high temperature stability, simple preparation and graphic processing technology, etc. It is an ideal transparent electrode material and is widely used in LCD, PDP , FED, OLED / PLED and other flat panel displays as transparent electrodes. [0003] In order to prepare the required electrode pattern, it is necessary to etch the ITO conductive film. Etching is the technique of removing material using chemical reaction or physical impact. Etching technology is divided into wet etching and dry etching, wherein wet etching uses chemical reagents to achieve the purpose of etching through chemical reactions. FeCl 3 It is an ITO etching solution, which...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09K13/04
CPCC09K13/04
Inventor 李虎宝朱祥龙殷泼清李冬明殷金虎
Owner ZHEJIANG SHINING ELECTRONICS MATERIALS CO LTD
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