Manufacturing method for micro-component transfer adapter
A manufacturing method and technology of micro-components, which are applied in the fields of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., and can solve problems such as thermal budget limitation and performance degradation of micro-components
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Embodiment 1
[0025] Embodiments of the present invention describe a transposition head for transferring micro components and a method for transferring micro components using the transposition head. Among them, micro-components can be micro-LED devices, diodes, transistors, integrated circuit (IC) chips, etc., and their size can be 1-100 μm, but they are not necessarily limited thereto, and some aspects of the embodiments are applicable to larger and more small size.
[0026] Figure 1~Figure 5 A schematic diagram of the manufacturing process of a transposition head for micro-component transfer is shown, which mainly includes the following process steps:
[0027] Please refer to the attached figure 1 , provide a package 302, the material of the package can be metal or silicon or ceramics or glass or plastic or any combination of the foregoing, silicon substrate is preferred as the material of the package in this embodiment.
[0028] Please refer to the attached figure 2 , fabricate an ...
Embodiment 2
[0038] Please refer to the attached Figure 7 The difference from Example 1 is that the arrayed micropore structure 3021 of this embodiment is formed using through-silicon via technology (TSV), and the depth of the perforation is less than 20 μm. The circular diameter W of the arrayed micropore structure 3021 is between 1 and 100 μm. The distance D is between 1-100 μm, and the size of the first opening 3022 is smaller than that of the second opening 3023 , which is more conducive to exerting the adsorption effect of the suction nozzle. In addition, in this embodiment, a functional layer 306 is formed on the inner surface of the arrayed micropore structure, such as a conductive layer or an insulating layer or other functional layers, preferably a metal strengthening layer as the functional layer.
Embodiment 3
[0040] Please refer to the attached Figure 8 The difference from Embodiment 1 is that in this embodiment, a suction nozzle is made at the second opening 3023 of the arrayed microporous structure 3021, and the material of the suction nozzle can be selected from metal or silicon or ceramics or glass or plastic or any combination of the foregoing, In this embodiment, Teflon plastic is preferred. The manufacturing process of the suction nozzle can be selected such as wire drawing process or through silicon via technology (TSV) or laser treatment or any combination of the aforementioned process technologies, preferably achieved by wire drawing process.
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Abstract
Description
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Application Information
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