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Etchant composition for metal layer containing silver or silver alloy

A technology of silver alloy and composition, applied in the field of etching liquid compositions containing etching regulators, can solve problems such as wiring short circuit, excessive etching, increase in etching deviation, etc., and achieve the effects of improving etching unevenness and maintaining etching deviation

Active Publication Date: 2017-01-18
ENF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the case of containing sulfuric acid as described above, over-etching may occur, and not only a part of the wiring may be short-circuited, but also may cause a Etch bias increases this undesirable

Method used

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  • Etchant composition for metal layer containing silver or silver alloy
  • Etchant composition for metal layer containing silver or silver alloy
  • Etchant composition for metal layer containing silver or silver alloy

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1 to 15 and comparative example 1 to 8

[0082] According to the component content disclosed in the following Table 1, each component was mixed to manufacture the etchant composition containing the silver or silver alloy metal film of Examples 1-15 and Comparative Examples 1-8.

[0083] 【Table 1】

[0084]

[0085]

[0086] The meanings of abbreviated terms used in the above tables are as follows.

[0087] IDA: iminodiacetic acid, DA: diacetic acid, EDTA: ethylenediaminetetraacetic acid, DTPA: diethylenetriaminepentaacetic acid, McA: malic acid, SA: succinic acid, TA: tartaric acid, LA: lactic acid, GA : glutaric acid, CA: citric acid, MA: malonic acid, Oz: oxalic acid.

[0088] on a glass substrate with a thickness of and and After depositing the three layers of indium tin oxide-silver or silver alloy film-indium tin oxide respectively, a photolithography process is performed to form a pattern, thereby manufacturing a test piece. The aforementioned silver alloy film refers to a silver-copper-palladium a...

experiment example 1

[0089] Experimental example 1: Evaluation of etching characteristics as the number of pieces processed increases

[0090] Measure etch bias (CD bias) with silver powder addition. The aforementioned etching deviation means that the size of the photoresist pattern formed on the substrate is smaller than the size of the mask pattern.

[0091] In order to carry out the evaluation in the above-mentioned Experimental Example 1, using the etching solution composition provided in the above-mentioned Examples 1 to 15 and Comparative Examples 1 to 8, in a sprayable device (Mini-etcher ME-001), at 40 ° C Under the conditions of 120 seconds of etching.

experiment example 2

[0092] Experimental example 2: Evaluation of the time until a wiring short-circuit occurs

[0093] The time at which a short circuit occurred in the wiring was measured according to the etching process time. The above evaluation was carried out by measuring the change in etching characteristics with the time of jetting in a jetting device (Mini-etcher ME-001).

[0094] In order to carry out the evaluation of the above-mentioned Experimental Example 2, using the etching solution compositions provided in the above-mentioned Examples 1 to 15 and Comparative Examples 1 to 8, in a sprayable device (Mini-etcher ME-001), at 40°C Etching was carried out for 12 hours.

[0095] Table 2 shows the results of Experimental Examples 1 and 2.

[0096] 【Table 2】

[0097]

[0098]

[0099] As shown in the results of Experimental Example 1 shown in Table 2 above, for Examples 1 to 15 comprising the etching solution composition provided by the present invention, when carrying out the etc...

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Abstract

The invention relates to an etchant composition for a metal layer containing silver or silver alloy. According to the invention, a carboxylic acid compound serves as an etchant speed adjusting agent and is contained in an etchant composition. The carboxylic acid compound has more than 3 carbons and meets a certain condition in terms of the number of carbons, carboxyls, and other functional groups other than carboxyls. Therefore, then etching is conducted on the metal layer which contains silver or silver alloy, the etchant composition can increase etching property, reduce the exchanges of etching agent and consumption amount of the etching agent, and can prevent unqulification caused by uneven etching.

Description

technical field [0001] The invention relates to an etching solution composition containing silver or a silver alloy metal film, in particular to an etching solution composition containing an etching regulator, and the etching regulator can improve the performance of a metal film containing silver or a silver alloy. etching properties. Background technique [0002] The reflector of the display plays the role of reflecting the light from the back to the front to reduce light loss. Compared with white paint-treated reflectors and aluminum reflectors, the silver-containing film reflects light from the rear to the front more efficiently, and can nearly double the illuminance. Therefore, a metal film containing silver or a silver alloy with less light loss is used in the reflection plate. [0003] On the other hand, as the resolution and size of display devices increase, wirings on thin film transistor substrates generally use wirings containing silver, which has higher conducti...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/30
CPCC23F1/30
Inventor 金世训李明翰
Owner ENF TECH
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