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Optical detection platform and optical detection method

An optical detection and platform technology, applied in the field of optical detection, can solve problems such as inability to detect optical components

Active Publication Date: 2017-01-18
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The present invention aims to overcome the technical defect that the existing detection platform cannot detect optical elements of various structural types, and provides an optical detection platform, including a first platform, a second platform, a fixing device, and a lifting module;

Method used

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  • Optical detection platform and optical detection method
  • Optical detection platform and optical detection method

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Embodiment Construction

[0041] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention, but not to limit the present invention.

[0042] The present invention designs an optical detection platform, which includes a first platform, a second platform, a fixing device, and a lifting module.

[0043] The first platform is placed on the bottom surface and is used for placing the optical element or interference device to be inspected. The second platform is used to place the interference device or the optical component to be inspected. The center of the second platform is provided with a through hole, which can make the light of the interference device pass through and completely irradiate on the optical element to b...

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Abstract

The invention relates to the technical field of optical detection, in particular to an optical detection platform, which comprises a first platform body, a second platform body, a fixing device and a lifting module. The first platform body is used for accommodating a detected optical element or an interfering device. The second platform body is used for accommodating the interference device or an optical element, and a through hole is formed in the central position of the second platform body. The lifting module is used for controlling the second platform body to be close to or far away from the first platform body. The first platform body is arranged at the bottom surface, and the second platform body is parallelly arranged above the first platform body. One end of the fixing device is fixed to the first platform body, and the other end is connected with the lifting module. The lifting module drives the second platform body to ascend and descent, so that second platform body is close to or far away from the first platform body, thereby adjusting cavity length of an interference cavity. By arranging the lifting module for controlling the second platform body to ascend and descent, the optical detection platform achieves the beneficial effect of realizing detection of various types of optical elements simply and rapidly.

Description

technical field [0001] The invention relates to the technical field of optical detection, in particular to an optical detection platform and an optical detection method. Background technique [0002] In order to achieve the required resolution and critical size of the projection lithography objective lens, the wave aberration of the optical system needs to reach the diffraction limit. The extreme ultraviolet lithography works in the extreme ultraviolet band with a wavelength of 13-14nm, which requires that the wave aberration of the optical system should be less than 1nmRMS, and the surface deviation of a single mirror should be 0.25nmRMS. To achieve such high-precision optical processing, it is first necessary to realize ultra-high-precision optical detection technology. Considering the influence of the deformation of the mirror body due to gravity, the posture of the mirror under test is required to be consistent with the posture during normal use. [0003] In the proces...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01M11/04
CPCG01M11/04
Inventor 金春水马冬梅于杰周烽张海涛
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI