High-temperature pressure sensor and manufacturing method thereof
A technology of a pressure sensor and a manufacturing method, which is applied in the measurement, instrument, and measurement force of the property force of piezoelectric resistance materials, can solve the fatigue of thin gold wires or welding places, the problem of stress balance is difficult to eliminate, and the welding points of gold wires are difficult to eliminate. Fatigue, etc.
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Embodiment 1
[0053] Embodiment 1, the manufacturing method of the above-mentioned high-temperature pressure sensor includes the following steps S1 to S5.
[0054] Please combine figure 2 , S1: providing a silicon substrate 1, the silicon substrate 1 is sequentially provided with a bulk silicon layer 11, an insulating layer 12 and a bulk silicon film 13 from bottom to top, and the silicon substrate 1 has an upper surface 16 and an upper surface 16 arranged opposite to each other. lower surface17. The silicon substrate 1 is an SOI substrate with a crystal orientation.
[0055] Please combine image 3 and Figure 4 , S2: forming a sensitive element 21 and a metal electrode 3 electrically connected to the sensitive element 21 on the upper surface (not labeled) of the silicon substrate 1 . The sensitive element 21 is a piezoresistor or a capacitance-based sensitive diaphragm, but in view of the advantages of high sensitivity and good precision, the piezoresistor is preferably a piezoresis...
Embodiment 2
[0067] Embodiment 2, the above-mentioned high-temperature pressure sensor can also adopt the following manufacturing method: including the following steps:
[0068] S1: Provide a silicon substrate, the silicon substrate is sequentially provided with a bulk silicon layer, an insulating layer, and a bulk silicon film from bottom to top, the silicon substrate has an upper surface and a lower surface arranged opposite to each other, the silicon substrate A lower groove is formed on the upper surface;
[0069] S2: forming a sensitive element and a metal electrode electrically connected to the sensitive element on the upper surface of the silicon substrate, the sensitive element is located in the lower groove;
[0070]S3: Provide an intermediate substrate made of high temperature resistant non-conductive material, the intermediate substrate has a front side and a back side arranged opposite to each other, and the back side of the intermediate substrate is bonded to the upper surface...
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