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Etching device

An etching device and etching technology are applied in the fields of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., which can solve problems such as low efficiency and energy consumption, and achieve the effects of increasing etching speed, saving energy, and improving uniformity

Pending Publication Date: 2017-04-05
TIANHUA MACHINE EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The vacuum is generated by the jet and the water pump. Since the water pump consumes energy and passes through the jet at the same time, the efficiency of vacuum generation is low.

Method used

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  • Etching device
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Embodiment 1

[0030] Please refer to the figure, embodiment one of the present invention is:

[0031] The etching device of this embodiment includes a body 1 and a water absorbing mechanism 2, and the water absorbing mechanism 2 is arranged in the body 1, and also includes a fan 3 and a gas-liquid separator 4, and the water absorbing mechanism 2 and the gas-liquid separator 4 pipeline connection (gas and liquid medicinal solution in the pipeline), the gas-liquid separator 4 is connected to the fan 3 pipeline (gas in the pipeline). The blower fan 3 is connected to the body 1 in a pipeline (there is gas in the pipeline). The gas-liquid separator 4 is connected with the pipeline of the body 1 (the pipeline is liquid). The flow direction of gas and liquid medicine is as follows: figure 1 indicated by the arrow in the middle. It also includes a recovery tank, the recovery tank is arranged in the body 1 and located at the bottom of the body 1, and the gas-liquid separator 4 is communicated wit...

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PUM

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Abstract

An etching device of the present invention comprises a machine body and a water absorption mechanism, and the water absorption mechanism is arranged inside the machine body. The etching device also comprises a draught fan and a gas-liquid separator, the water absorption mechanism is in pipe connection with the gas-liquid separator, and the gas-liquid separator is in pipe connection with the draught fan. The etching device of the present invention can save the energy sources, and enables the vacuum-pumping efficiency to be improved remarkably and the etching uniformity and the etching speed to be improved.

Description

technical field [0001] The invention relates to etching technology, in particular to an etching device. Background technique [0002] Etching is usually also called photochemical etching, which refers to removing the protective film of the area to be etched after development, and contacting a chemical solution during etching to achieve the effect of dissolution and corrosion. In order to improve the uniformity of etching, a water absorption mechanism is generally installed on the upper side of the conveying roller, and the water absorption mechanism discharges the liquid medicine on the upper plate surface to improve the quality of the workpiece. In the etching device in the prior art, the water absorption mechanism is connected with the jet and the water pump. After the water pump pumps water, it is driven into the jet, and after being ejected from the jet, a vacuum will be generated on its upper part. When it is connected to the water absorption mechanism, the water absorp...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67H01L21/306
CPCH01L21/30604H01L21/67075
Inventor 曾祥秒
Owner TIANHUA MACHINE EQUIP CO LTD