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A device that can continuously adjust the plasmon resonant peak

A technology of plasmon resonant peak and surface plasmon, applied in the field of metamaterials, can solve the problem of small adjustment range of plasmon resonant peak

Active Publication Date: 2019-04-12
HUAZHONG UNIV OF SCI & TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Aiming at the defects of the prior art, the present invention provides a device that can continuously adjust the plasmon resonant peak, the purpose of which is to realize the large-scale continuous controllable adjustment of the plasmonic resonant peak by utilizing the good mechanical properties of the flexible substrate ; Aim to solve the problem of small adjustment range of the plasmon resonance peak in the prior art

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  • A device that can continuously adjust the plasmon resonant peak
  • A device that can continuously adjust the plasmon resonant peak
  • A device that can continuously adjust the plasmon resonant peak

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Embodiment Construction

[0018] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0019] The purpose of the present invention is to provide a new dimension for the continuous adjustment of the plasmon resonant peak, and achieve the purpose of continuously and controllably adjusting the plasmonic resonant peak by utilizing the good mechanical properties of the flexible substrate. This method is also passive and has advantages in energy consumption. At the same time, the existing technology can be combined to obtain a wider range of adjustment.

[0020] A device that can continuously adjust the plasmon resonance peak provided by the present invention includes: a flexible substrat...

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Abstract

The invention discloses a device capable of continuously adjusting plasmon resonance peaks, which includes: a flexible substrate with a periodic structure, and strips periodically arranged on the flexible substrate and having surface plasmon resonance properties; By compressing or stretching the flexible substrate to change the period and amplitude of the flexible substrate, the geometric shape of the strip and the effective dielectric constant of the environment are changed, and the plasmon resonance peak can be adjusted. The minimum repeating unit of the cross-sectional shape of the flexible substrate is sinusoidal, triangular, trapezoidal or semicircular. The strip coverage is less than half the period of the smallest repeating unit of the flexible substrate. The invention can realize the beneficial effect of continuously and controllably adjusting the position of the plasmon resonant peak in a large range.

Description

technical field [0001] The invention belongs to the field of metamaterials, and more specifically relates to a device capable of continuously adjusting plasmon resonance peaks. Background technique [0002] The continuous tunability of the plasmon resonance peak is of great significance to the fields of biosensing, optoelectronics and so on. In the existing literature, for traditional metal materials, it is mainly by changing the size and spacing of the prepared structure. The size itself will change the position of the resonance peak, and the spacing will affect the coupling between the structures, thereby affecting the position of the resonance peak. . For the material of graphene, its electrons are massless two-dimensional electrons. In addition to changing the size, spacing and number of layers of graphene nanostructures, it can also be adjusted by changing the Fermi level of graphene. Changing the size, spacing, and number of layers of graphene nanostructures can chan...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L29/84H01L29/16H01L51/00
CPCH01L29/1606H01L29/84H10K77/111Y02E10/549
Inventor 臧剑锋刘欣王力喻研叶镭
Owner HUAZHONG UNIV OF SCI & TECH
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