Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method of acquiring target RCS by using high resolution imaging

A high-resolution, target-oriented technology, applied in radio wave measurement systems, instruments, etc., can solve the problems of limited imaging accuracy, difficulty in completing compensation, and lack of feasibility, achieving high imaging accuracy and ensuring computational accuracy.

Inactive Publication Date: 2017-04-19
NORTHWESTERN POLYTECHNICAL UNIV
View PDF0 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The SAR imaging method used in the method described in the literature has limited imaging accuracy, and the obtained scattering center position and intensity information have certain errors. Even through calibration, it is difficult to complete the compensation. In the RCS error limit requirements Lack of feasibility in case of higher

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method of acquiring target RCS by using high resolution imaging
  • Method of acquiring target RCS by using high resolution imaging
  • Method of acquiring target RCS by using high resolution imaging

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] The present invention will be further described below with reference to the accompanying drawings and embodiments. The present invention includes but is not limited to the following embodiments.

[0025] 1. High-precision imaging of the target.

[0026] Through single-station turntable measurement, sweep frequency measurement within the required frequency range to obtain the resolution of the target in the radial distance, and the rotation around the turntable to obtain the resolution of the target in the lateral distance, while making the target area at the maximum Within the unblurred distance, use the two-dimensional filter-inverse projection algorithm to image the obtained near-field echo data of the target to obtain the two-dimensional image γ(x,y) of the target area, where x is the abscissa of the two-dimensional image, y Is the ordinate of the two-dimensional image. Specifically:

[0027] By measuring the target in different frequency domains and angular domains, the ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method of acquiring a target RCS by using high resolution imaging. Firstly, a filtered-back projection algorithm is adopted to carry out imaging processing on target near field echo data; then, through a CLEAN algorithm, scattering centers are extracted from a two-dimensional image sequentially from strong to weak; and finally, each scattering center serves as a discrete point scattering source for vector composition to rebuild a target scattering field, and thus, the target RCS is calculated and obtained. As the filtered-back projection algorithm is high in imaging precision, the position information and the strength value of each scattering center of the target can be accurately presented; as the rebuilt scattering field is generated by a limited number of scattering centers extracted through the CLEAN algorithm, the scattering features of the target can be restored completely, and environment noise outside the target is not introduced. As no far field testing distance problem exists for the scattering centers, the scattering features obtained through vector composition are the far field scattering features of the target, and the target RCS calculation precision is ensured.

Description

Technical field [0001] The invention belongs to the field of microwave measurement, and particularly relates to a method for extracting the scattering center of a target from a high-precision two-dimensional image and vectorizing an electric field to obtain the target RCS. Background technique [0002] The RCS that can accurately measure the target is an important prerequisite for the design and evaluation of the stealth performance of weapons. Measuring RCS needs to meet the far-field measurement conditions at the test distance. Conventional RCS measurement methods mainly include outdoor RCS test field measurement, compact field shrinkage measurement and indoor microwave anechoic chamber measurement, which have all developed to a fairly mature stage. The large outdoor field generally has a large enough test space, but it is greatly affected by the weather and environment, and the confidentiality is not strong; the compact field can pass the incident wave through the parabolic r...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01S7/41
CPCG01S7/41
Inventor 胡楚锋徐志浩陈卫军张麟兮
Owner NORTHWESTERN POLYTECHNICAL UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com