Unlock instant, AI-driven research and patent intelligence for your innovation.

Method and apparatus for slicing and viewing samples

A kind of equipment and slicing technology, applied in the direction of using wave/particle radiation for material analysis, discharge tube, instrument, etc., can solve the problems of lack of flatness, non-flat surface, and reduced resolution

Active Publication Date: 2019-05-28
FEI CO
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Applicants have found that the presence of curtains and other artifacts produces topographical changes that mean the surface is not flat, and that this lack of flatness manifests itself as noise (eg, reduced resolution) in the 3D representation formed from the image of the exposed surface

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and apparatus for slicing and viewing samples
  • Method and apparatus for slicing and viewing samples
  • Method and apparatus for slicing and viewing samples

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030] In the following discussion and in the claims, the terms "comprises" and "comprises" are used in an open fashion, and thus should be construed to mean "including but not limited to". To the extent any term is not specifically defined in this specification, it is intended that the term be given its plain and ordinary meaning. Furthermore, use of the term "and / or" herein should be read as an "inclusive" or rather than an "exclusive" or. For example, the phrase "A and / or B" as used herein will mean "A, B, or A and B." As another example, as used herein, the phrase "A, B, and / or C" would mean "A, B, C, or any combination thereof." Furthermore, whenever the terms "automatic," "automated," or similar terms are used herein, those terms will be understood to include manual initiation of automatic or automated processes or steps.

[0031] As used herein, the terms "milling" and "etching" refer to the removal of sample material, and the terms "sectioning", "slicing milling" and...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Methods, apparatus and systems for sectioning and viewing of samples with a dual beam system. The slicing and viewing process includes exposing a vertical wall of a groove formed in the sample surface; capturing a first image of the wall by interrogating the wall with the beam while the wall is in a first orientation relative to the interrogating beam; by Interrogating the wall with the beam to capture a second image of the wall while the wall is in a second orientation relative to the beam, wherein the first distance in the first image between a surface point on the wall and a reference point is different from the reference a second distance in the second image between the point and the surface point; determining an elevation of the surface point using the first distance and the second distance; and fitting a curve to a topography of the wall using the elevation.

Description

technical field [0001] The present invention relates to methods, devices and systems for imaging samples in two and three dimensions using beams, such as charged particle beams. Background technique [0002] Electron microscopy offers the opportunity to study the ultrastructure of a wide range of biological and inorganic specimens in 3D with high resolution. For example, in the field of biological sciences, electron microscopy allows observation of the molecular mechanisms of disease, the conformation of flexible protein structures, and the properties of individual viruses and proteins in their natural biological context. As another example, electron microscopy plays an important role in quality control in the fabrication of semiconductors and electronic devices by allowing the detection and characterization of nanoscale defects in electrical, optical, and micromechanical systems that can affect such Product performance. Defects may include contaminant particles that becom...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/26H01J37/08
CPCG01N23/2208G01N23/2251G01N23/2255H01J37/265H01J37/3023H01J37/3056H01J2237/2611H01J2237/2814H01J2237/31745H01J37/26H01J2237/31749
Inventor V.布罗登
Owner FEI CO