A kind of solar silicon chip surface cleaning treatment method

Abstract

The invention relates to a solar silicon wafer surface cleaning method. The used system comprises an installation supporting frame; a cleaning groove mechanism, first and second drying treatment boxes, four mechanical moving mechanisms and three cleaning groove mechanical arm components are arranged on the installation supporting frame; the cleaning groove mechanism further comprises a plurality of solar silicon wafer bearing flower baskets, and a plurality of isolation plates used for isolating the solar silicon wafers are arranged on the solar silicon wafer bearing flower baskets; each drying treatment box comprises a drying treatment box body, a circulating fan and a heater; box bodies capable of moving up and down are arranged on front and back sides of the drying treatment box body, the box body on one side forms the inlet of the drying treatment box body, and the box door on the other side forms the outlet of the drying treatment box body; an inner flower basket supporting and moving mechanism moving back and forth is arranged on the left and right sides in the drying treatment box body separately. The solar silicon wafer surface cleaning method disclosed by the invention is suitable for cleaning operation of solar cells and has high automation performance. By adoption of the cleaning process provided by the invention, the solar cells can obtain a good cleaning effect

Description

technical field [0001] The invention relates to a method for cleaning and treating the surface of solar silicon wafers, belonging to the technical field of solar cell processing. Background technique [0002] In the production process of solar cells, the requirements for the surface cleaning of silicon wafers are very high, so as to avoid the introduction of impurities in the cleaning process, which will affect its use effect. Improve the surface cleaning effect of solar silicon wafers. Generally, the surface cleaning of solar silicon wafers is carried out with cleaning liquid. This cleaning method consumes a lot of energy and has high environmental requirements, and is suitable for mass production. However, in actual production, the surface cleaning of solar silicon wafers also needs to be improved by other methods. Contents of the invention [0003] The purpose of the present invention is to provide a method for cleaning and treating the surface of solar silicon wafers ...

AI Technical Summary

Problems solved by technology

Generally, the surface cleaning of solar silicon wafers is carried out with cleaning liquid. This cleaning method consumes a lot of energy and has high environmental requirements, and is suitable for mass production. However, in actual production, the surface cleaning of solar silicon wafers also needs to be improved by other methods.