Cleaning device for copper strip machining

Abstract

The invention discloses a cleaning device for copper strip machining. The cleaning device comprises a water tank. A first guide roller, a second guide roller and a third guide roller are mounted in the water tank through rotating shafts. The first guide roller and the third guide roller are located on the same horizontal plane. The second guide roller is located between the first guide roller and the third guide roller and meanwhile located below the first guide roller and the third guide roller. A base is welded to the right side face of the water tank. A supporting strip is welded between the bottom face of the base and the right side face of the water tank. A liquid accumulation groove is formed in the upper surface of the base, and third bristles are arranged in the liquid accumulation groove. Second bristles are arranged on the upper surface of the base. A support is welded to the right end of the base. A fourth guide roller is mounted on the support through a rotating shaft. By means of the cleaning device, a cleaning agent can be dispersed to the bottom face and the surface of a copper strip well, the copper strip is cleaned thoroughly, and the quality of the copper strip is improved.

Description

technical field [0001] The invention relates to the technical field of copper strip processing, in particular to a cleaning device for copper strip processing. Background technique [0002] Copper strip is a kind of metal component. The product specifications are 0.1~3×50~250mm copper strip products in various states. It is mainly used for the production of electrical components, lamp holders, battery caps, buttons, seals, and connectors. It is mainly used for conductive , Heat conduction, corrosion-resistant equipment. Such as electrical components, switches, gaskets, gaskets, electric vacuum devices, radiators, conductive base materials, and automotive water tanks, heat sinks, cylinder plates and other parts. The production of copper strip needs to go through steps such as high temperature annealing, grinding, slitting and cutting. During the above production process, more dirt, copper scraps and particles will be generated on the surface of the copper strip. Therefore, a...

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Problems solved by technology

[0003] The purpose of the present invention is to provide a cleaning device for copper strip processing, which has the advantages of being able to disperse the cleaning agent well on the bottom and surface of the copper strip, so that the copper strip can be cleaned more thoroughly, and the quality of the copper strip is improved. When cleaning the copper strip, the cleaning agent cannot be evenly dispersed on the surface of the copper strip, resulting in insufficient cleaning of the copper strip and affecting the quality of the copper strip

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