Automatic mask cleaning system and automatic mask cleaning method

Abstract

The invention discloses an automatic mask cleaning system and an automatic mask cleaning method. The system comprises exposure machine control terminals, a cleaning device and a master control device. The exposure machine control terminals are connected with corresponding exposure machines and used for controlling exposure process of the exposure machines and monitoring utilization frequency of each mask in the exposure machines. The cleaning device is used for cleaning the masks. The master control device is connected with the exposure machine control terminals and the cleaning device and used for controlling the cleaning device to clean to-be-used masks in advance according to information of the to-be-used masks in each exposure machine and automatically sending mask cleaning alerts after monitoring that utilization frequency of the masks in the exposure machines reaches a preset frequency. The automatic mask cleaning system and the automatic mask cleaning method have advantages that the to-be-used masks can be cleaned in advance, and cleaning alerts are sent according to utilization conditions of the masks, so that manpower is saved, the masks which possibly affect exposure effects can be cleaned timely, and productivity is improved.

Description

technical field [0001] The invention relates to the field of automation, in particular to an automatic cleaning system and method for a mask plate. Background technique [0002] In the existing color filter substrate manufacturing process, the patterning of the color filter is usually realized by an exposure machine, and the proximity exposure machine is most used. The distance between the mask plate of this kind of exposure machine and the substrate to be exposed is between 100-400 μm. Such a small distance makes the mask plate very easy to be contaminated by foreign matter attached to the exposure substrate, or the mask plate is easily contaminated by the photoresist due to long-time exposure. Volatile contamination during glue exposure, and once the mask plate is contaminated, it will cause common defects, seriously affect product quality, and even cause product NG. [0003] In response to the above problems, the common measures taken in the industry today are to use a m...

AI Technical Summary

Problems solved by technology

Obviously, this kind of manual management method will not only consume a lot of manpower, but also easily cause the mask to be missed and washed due to the negligence of personnel management. Once the mask is missed and washed, it is easy to cause Common defects or common Mura, however, this situation will cause relatively large product and capacity loss in the factory

At the same time, since the mask board needs to be called out manually before each use and the corresponding settings are selected for cleaning, in this case, once the personnel do not clean the mask board in time, it will also cause the production line to fail. Timely start, serious waste of capacity

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