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Schematic diaphragm version comparing method based on topological relation

A technology of topological relationship and version comparison, applied in the direction of electrical digital data processing, special data processing applications, instruments, etc., can solve the problems of schematic diagram database file differences and the inability to directly "see schematic diagram differences"

Active Publication Date: 2017-05-31
北京华大九天科技股份有限公司
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AI Technical Summary

Problems solved by technology

For circuit designers, the differences mainly include key differences affecting simulation results such as circuit topology and device properties; however, for schematic diagrams, the differences are reflected in any modification of the schematic database file, except for circuit topology, In addition to the key differences affecting the simulation results such as device properties, moving or rotating the physical position of the device or net will also cause differences in the schematic database file
In addition, schematic databases are usually composed of binary files, and the schematic designer cannot directly "see" the differences between different versions of the schematic

Method used

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  • Schematic diaphragm version comparing method based on topological relation
  • Schematic diaphragm version comparing method based on topological relation
  • Schematic diaphragm version comparing method based on topological relation

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Embodiment Construction

[0037] The overall process of the present invention is as figure 1 As shown, in order to facilitate the understanding of the technical solution, the following combination figure 2 — Figure 8 Examples in the present invention are further described in detail.

[0038] for example: image 3 — Figure 8 are two different versions of a schematic drawn with mainstream schematic design tools, figure 2 is the hierarchical topological relationship diagram of the entire schematic diagram, and the hierarchical topological relationship of version 1 and version 2 is the same, where image 3 , Figure 4 They are the version 1 and version 2 of the corresponding unit of TOP respectively, call the subunit inv, test, Figure 5 , Figure 6 are version 1 and version 2 of the corresponding unit of inv, respectively, Figure 7 , Figure 8 are version 1 and version 2 of the corresponding unit of test, respectively. For this example, the difference between version 1 and version 2 is comp...

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Abstract

The invention provides a schematic diaphragm version comparing method based on topological relation and belongs to the field of automation design of semiconductor integrated circuitry; the method is used for comparing differences between versions of two schematic diaphragms, with the neglecting for device or network physical position shifting, or differences between physical coordinates of rotating images and the like, as well as topological structural differences due to exchangeability of pins of devices. Hierarchical topological relation comparing is carried out first, all devices and networks in each unit are compared according to the inverse topological sequence, and only the key differences influencing simulation results, such as circuit topological structures or devices in schematic diaphragms are analyzed according to circuit connection topological relations.

Description

technical field [0001] The invention belongs to the field of automatic design of semiconductor integrated circuits, and mainly relates to the difference comparison between different versions of schematic diagrams (Schematic) in the design process. Background technique [0002] In the process of circuit schematic design, integrated circuit designers will perform circuit simulation after completing the schematic design. If the simulation results do not meet the design expectations, they will modify the schematic and re-simulate, and may even fail because the simulation results are not as good as above. One-time design and undo the modification, and iterate continuously until the schematic diagram meets the design expectations. Therefore, in the design process of the schematic diagram, it is inevitable to constantly modify the schematic diagram design, thereby producing different schematic diagram versions. [0003] The schematic diagram designer will compare the specific diff...

Claims

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Application Information

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IPC IPC(8): G06F17/50
CPCG06F30/39
Inventor 李桢荣戴文华吴琴霞李志梁
Owner 北京华大九天科技股份有限公司
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