Fast heating-up control method and device based on photo-thermal type and heating furnace

Abstract

The present invention relates to a fast heating-up control method and device based on a photo-thermal type and a heating furnace. The method comprises the following steps: performing parameter calibration of a receiver putting samples; setting a target heating parameter, and generating corresponding heating factors according to the target heating parameter and the calibration parameter received by the receiver; performing illumination heating of the samples in the receiver according to the heating factors, detecting an actual heating parameter in the receiver in real time, comparing the actual heating parameter and the target heating parameter, quitting the samples in the receiver when the actual heating parameter is the same as the target heating parameter, and finishing a heating flow. Corresponding heating factors are generated according to the target heating parameter and the calibration parameter of the receiver, active heating of the samples in the receiver are performed according to the corresponding heating factors, and the samples are not directly heated so as to realize fast heating up and ensure accurate control of the heating process.

Description

technical field [0001] The invention relates to the technical field of temperature control, in particular to a photothermal-based rapid temperature rise control method, device and temperature rise furnace. Background technique [0002] Rapid heating furnaces are more and more widely used in current scientific research and production preparation. At present, the mainstream rapid heating furnaces are mainly divided into two types: special resistance wire furnaces and iodine tungsten lamp heating furnaces. The former requires special heating wires. The preparation process is complicated. The requirements for the furnace body are strict. The current heating rate is 180°C-200°C / min, and the cost is relatively high; the latter was first used in metal preparation by the Japan Vacuum Institute of Technology at the end of the 20th century. At present, the heating rate of the domestic iodine-tungsten lamp rapid heating furnace is 600°C-800°C / min, although the heating rate meets the re...

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Problems solved by technology

[0004] One is to rely on the feedback adjustment mechanism to control the temperature rise. Under the condition of rapid temperature rise and such a high temperature rise rate, it is likely to cause the temperature to exceed the set value and cause production accidents or failure of scientific research experiments;

[0005] The second is that in the photothermal rapid temperature rise device, the temperature of the heated substance is largely related to its own properties. However, the actual temperature measured by the existing device is the indirect temperature of the thermocouple that is not in contact with the sample, which is also to a certain extent It affects the accuracy of the temperature of the photothermal heating furnace;

[0006] The third is that the temperature control system lacks a certain database support, and lacks necessary data analysis and protection measures for possible problems in the system, such as abnormal heating time. Traditional heating units are much larger

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