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Method of monitoring internal temperature of evaporation source

A technology of internal temperature and evaporation source, which is applied in the direction of vacuum evaporation plating, metal material coating process, coating, etc., can solve the problem of not being able to obtain the internal temperature of the evaporation source, and achieve the goal of improving evaporation efficiency and evaporation uniformity Effect

Active Publication Date: 2017-06-30
CHENGDU BOE OPTOELECTRONICS TECH CO LTD +1
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Problems solved by technology

[0004] The purpose of the technical solution of the present invention is to provide a method for monitoring the internal temperature of the evaporation source to solve the problem that the internal temperature of the evaporation source cannot be obtained in the prior art

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Embodiment Construction

[0033] In order to make the technical problems, technical solutions and advantages to be solved by the embodiments of the present invention clearer, the following will describe in detail with reference to the drawings and specific embodiments.

[0034] An embodiment of the present invention provides a method for monitoring the internal temperature of the evaporation source, such as figure 1 As shown, the method comprises the steps of:

[0035] S110, according to the inner and outer wall temperatures at the nozzle mouth of the evaporation source in the current evaporation state, calculate the heat transfer coefficient of the evaporation source for heat conduction in the current evaporation state;

[0036] S120. According to the temperature of the first position on the outer wall of the evaporation source in the current evaporation state and the heat transfer coefficient, calculate the temperature of a second position inside the evaporation source in the current evaporation stat...

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Abstract

The invention provides a method of monitoring the internal temperature of an evaporation source. The method comprises the following steps: according to the temperature of an internal wall and the temperature of an external wall of a nozzle opening of the evaporation source in a current evaporation state, a heat conduction coefficient of the evaporation source which carries out heat conduction is calculated in the current evaporation state; and according to the temperature of a first position in the external wall of the evaporation source in the current evaporation state and the heat conduction coefficient, the temperature of a second position in the evaporation source in the current evaporation state is calculated, wherein the second position is a projection of the first position on the inner wall of the evaporation source. According to the method, through monitoring the temperature of the internal wall and the temperature of the external wall of the nozzle opening of the evaporation source, the heat conduction coefficient of the evaporation source in the current state can be obtained, and on this basis, according to the detection temperature of a position point at the external wall of the evaporation source, the internal temperature of a corresponding position can be obtained, so that the problem that the internal temperature of the evaporation source can not be obtained in the prior art is solved.

Description

technical field [0001] The invention relates to a display process monitoring technology, in particular to a method for monitoring the internal temperature of an evaporation source. Background technique [0002] Currently, Organic Light Emitting Diode (OLED) display has become a hot spot in the display field due to its advantages such as self-luminescence, wide viewing angle, short response time, high luminous efficiency, wide color gamut, and low operating voltage. Among them, the essential process of the OLED display process is material evaporation, and the display uniformity of the display is directly related to the evaporation uniformity of the material, and the evaporation uniformity is related to the temperature and evaporation rate of the evaporation material evaporated. Therefore, it is very important to monitor the working status of the evaporation source in real time. [0003] In the prior art, by monitoring the temperature of the external heat source of the evapor...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/54C23C14/52C23C14/24
CPCC23C14/24C23C14/52C23C14/54
Inventor 吴建鹏梁逸南罗昶嵇凤丽杨忠英
Owner CHENGDU BOE OPTOELECTRONICS TECH CO LTD