Device for generating plasma photonic crystals with different gas temperatures

A plasma and photonic crystal technology, applied in the field of plasma application technology and optics, to achieve wide application prospects and increase the effect of selection methods

Inactive Publication Date: 2017-06-30
HEBEI UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in the above patents, the gas temperature in the discharge air gap is the same when the plasma photonic crystal is formed, and no plasma photonic crystal with different gas temperature has been reported in the prior art.

Method used

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  • Device for generating plasma photonic crystals with different gas temperatures
  • Device for generating plasma photonic crystals with different gas temperatures
  • Device for generating plasma photonic crystals with different gas temperatures

Examples

Experimental program
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Embodiment 1

[0022] Embodiment 1, a device for generating plasma photonic crystals with different gas temperatures.

[0023] Such as figure 1 As shown, the device for generating plasma photonic crystals with different gas temperatures provided by the present invention is specifically: two airtight dielectric containers are symmetrically arranged in a horizontal cylindrical vacuum reaction chamber 1, and water is injected into the airtight dielectric container. A water electrode 2 with two polar plates facing each other is formed. The two water electrodes 2 are electrically connected with the plasma generating power source 5 outside the vacuum reaction chamber 1 . In this embodiment, the water electrode 2 is made of a plexiglass tube sealed by glass baffles 3 at both ends, the plexiglass tube is filled with water, and a copper ring 4 is set in the plexiglass tube. The two copper rings 4 are respectively electrically connected to the positive pole and the negative pole of the plasma genera...

Embodiment 2

[0030] combine figure 1 and figure 2, a vacuum reaction chamber 1 is set, an air inlet 7 and an air outlet 8 are opened on the wall of the vacuum reaction chamber 1, and two water electrodes 2 opposite to each other are installed in the vacuum reaction chamber 1. The water electrode 2 is composed of a plexiglass tube sealed with glass baffles 3 on both sides and filled with water, and a built-in copper ring 4 is electrically connected to the plasma generating power supply 5 outside the vacuum reaction chamber 1 .

[0031] A solid frame 6 with a thickness of 1mm is arranged between the two water electrodes 2. The solid frame 6 is made of resin material, and its plane is perpendicular to the axes of the two water electrodes 2, and the two sides are close to the two water electrodes 2. end face. 16*16 circular through holes with a diameter of 1mm are opened in the inner area of ​​the solid frame 6, and the minimum distance between adjacent through holes is 1mm. The area of ​​...

Embodiment 3

[0035] Compared with Embodiment 2, this embodiment differs in that the discharge gas is a mixture of air and argon, the volume content of argon is 30%, and the voltage amplitude is 2.72kV. When the switch is closed, the plasma generating power supply 5 acts on the two water electrodes 2, which can generate alternating single and double point plasma luminescent patterns, such as Figure 6 shown. Figure 6 and image 3 Similarly, except for the outermost circle of plasma luminescence patterns, the internal plasma luminescence patterns present an alternate arrangement of single and double points, that is, the plasma in two adjacent through holes (or pores) The structure of the luminescent pattern is different, one is a single discharge wire (corresponding to a single-point structure), and the other is two bundles of discharge wires (corresponding to a double-point structure).

[0036] Collect the rotation spectra of nitrogen molecular ions in two adjacent through holes during d...

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Abstract

The invention provides a device for generating plasma photonic crystals with different gas temperatures. The device comprises a vacuum reaction chamber, water electrodes and a plasma generation powder supply. Two water electrodes are arranged in the vacuum reaction chamber, and copper rings are arranged in the water electrodes; the plasma generation powder supply is electrically connected with the water electrodes by the copper rings; a specially-made solid frame is arranged between the two water electrodes and formed through uniform arrangement of (10*10)-(20*20) holes with the diameter of 1 mm, preferably 16*16, and the space between two adjacent holes is 1 mm. With the adoption of the device, the plasma photonic crystals with different gas temperatures can be generated. According to the device, the plasma photonic crystals with different gas temperatures are firstly realized, selection manners of beam-focusing modulation are increased, diversification, convenience and high efficiency of beam modulation are realized by control and adjustment on light spreading, and the device has a wide application prospect in the industrial field.

Description

technical field [0001] The invention relates to the fields of plasma application technology and optical technology, in particular to a device for generating plasma photonic crystals with different gas temperatures. Background technique [0002] Photonic crystals, also known as photonic bandgap materials, are an artificial "crystal" structure formed by arranging two dielectric materials with different dielectric constants in space at a certain period (the size is on the order of the wavelength of light). The dielectric constant of a photonic crystal is a periodic function of space. If the periodic modulation of photons by the dielectric coefficient is strong enough, the photon energy propagating in the photonic crystal will also have an energy band structure, and photon "forbidden" will appear between the bands. band", photons whose frequency falls in the forbidden band cannot propagate in the crystal. The position and shape of the photonic forbidden band depend on the refra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/00
CPCG02B1/005
Inventor 董丽芳刘彬彬崔义乾
Owner HEBEI UNIVERSITY
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