A Grating Type Vertical Position Measurement System
A vertical position and measurement system technology, applied in the direction of measuring devices, optical devices, instruments, etc., can solve the problems of destroying the linear relationship, the uniformity of the measurement spot, and affecting the measurement accuracy and repeatability, so as to improve the measurement accuracy , reduce dependence, improve the effect of process adaptability
Active Publication Date: 2019-12-24
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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like figure 2 As shown, the image of the process graphic layer is imaged to the detection slit surface with the help of direct reflected light and diffracted light, and superimposed on the image formed by the projection slit on the detection slit surface, which leads to the deterioration of the uniformity of the final measurement spot and destroys the vertical The linear relationship between the position and the detected light intensity causes the measurement results to strongly depend on the underlying process pattern, seriously affecting the measurement accuracy and repeatability
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[0027] The specific embodiments of the present invention are given below in conjunction with the accompanying drawings, but the present invention is not limited to the following embodiments. Advantages and features of the present invention will be apparent from the following description and claims. It should be noted that all the drawings are in very simplified form and use imprecise ratios, which are only used for the purpose of conveniently and clearly assisting in describing the embodiments of the present invention.
[0028] Please refer to image 3 with Figure 4 , image 3 Shown is a schematic structural diagram of a grating vertical position measurement system in a preferred embodiment of the present invention. Figure 4 Shown is a schematic structural diagram of a grating type vertical position measurement system according to another preferred embodiment of the present invention. The present invention proposes a grating-type vertical position measurement system, whi...
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The invention provides a grating type vertical position measuring system, which sequentially comprises a lighting unit, an imaging unit and a relay unit along the light path propagation direction, and is characterized in that the imaging unit comprises a projection branch and a detection branch, the projection branch has a projection slit, and the detection branch has a detection slit. The grating type vertical position measuring system further comprises a random noise generating device which is arranged in the imaging unit. The grating type vertical position measuring system provided by the invention reduces the dependency of a measurement result for a bottom technological pattern, improves the measurement accuracy and thus improves the technological adaptability of a vertical measuring device.
Description
technical field [0001] The invention relates to the field of semiconductor and integrated circuit manufacturing, and in particular to a grating type vertical position measuring system. Background technique [0002] Optical position measurement technology is more and more widely used in various finishing equipment. Compared with other measurement methods, optical measurement has many advantages such as non-contact and high precision. As the core equipment of finishing equipment, the lithography machine takes optical measurement as the core tool for all position measurement. [0003] Generally speaking, the workpiece stage used to carry silicon wafers and masks requires higher accuracy in the horizontal direction than in the vertical direction. However, with the increasing technological requirements, in recent years, it is gradually required that the vertical position of the workpiece table can be measured quickly and accurately. [0004] As the operating wavelength of the p...
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IPC IPC(8): G01B11/00
CPCG01B11/00
Inventor 王福亮徐荣伟孙建超
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD