Auxiliary supporting apparatus and photoetching machine equipment equipped with same

A technology of auxiliary support and elastic support device, which is applied in the direction of photomechanical equipment, microlithography exposure equipment, photolithography exposure device, etc.

Active Publication Date: 2017-07-07
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the four-legged equipment structure is difficult to adjust the surface shape through the four surrounding shock absorbers 205

Method used

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  • Auxiliary supporting apparatus and photoetching machine equipment equipped with same
  • Auxiliary supporting apparatus and photoetching machine equipment equipped with same
  • Auxiliary supporting apparatus and photoetching machine equipment equipped with same

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Embodiment Construction

[0041] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0042] To achieve the above purpose, please refer to Figure 4, The present invention provides an auxiliary support device used in photolithography equipment, which includes an elastic support device connected to each other, a shock absorbing component, and a driving magnetic field device in sequence from top to bottom.

[0043] Please refer to Figure 5 , the elastic support device includes a support guide 101, a support spring 102, and a spring guide 103 from top to bottom, the support guide 101 and the spring guide 103 are inserted into the support spring 102, the support guide 101 and the spring guide 103 The spring guide 103 is used for guiding the support spring 102 . The length of the support spring 102 can vary vertically, so...

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PUM

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Abstract

The invention provides an auxiliary supporting apparatus used for photoetching machine equipment. The auxiliary supporting apparatus comprises an elastic supporting apparatus, a vibration absorption part and a driving magnetic field apparatus which are connected mutually from the top to bottom in sequence; and the driving magnetic field apparatus has mutual repulsive force on the elastic supporting apparatus, so that the elastic supporting apparatus can support a suspension frame used for placing a workpiece table. The supporting force is adjusted by using magnetic field force and the elastic apparatus, so that degree of freedom in a vertical direction is ensured; and the vibration absorption part which can adsorb base vibration is also provided, so that the supporting surface type of the workpiece table can be compensated while base vibration is not introduced. The invention also provides the photoetching machine equipment equipped with the auxiliary supporting apparatus. The photoetching machine equipment comprises the workpiece table, the suspension frame used for placing the workpiece table, and also comprises n auxiliary supporting apparatuses, wherein n is positive integer; and by adoption of the multiple auxiliary supporting apparatuses, the supporting force can be adjusted according to surface type change of the location, so that the supporting surface type of the workpiece table can be well compensated.

Description

technical field [0001] The invention relates to the field of semiconductor lithography machines, in particular to an auxiliary support device and lithography machine equipment with auxiliary supports. Background technique [0002] During the working process of the lithography machine system, the workpiece table and the mask table are respectively based on the two sides and one axis (object plane, focal plane and optical axis) of the exposure system. Driven by the control system, the workpiece table and the mask table are realized according to the required precision. The relative position between the mask tables and the position of the two relative to the exposure system. For the lithography machine equipment supported by four shock absorbers and four legs, under the influence of its own gravity, processing error, integration error and dynamic deformation of the workpiece table, the surface of the workpiece table support part will be concave and deformed, thus affecting the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70833G03F7/709
Inventor 季采云廖飞红钟亮王璟
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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