Auxiliary supporting apparatus and photoetching machine equipment equipped with same

Abstract

The invention provides an auxiliary supporting apparatus used for photoetching machine equipment. The auxiliary supporting apparatus comprises an elastic supporting apparatus, a vibration absorption part and a driving magnetic field apparatus which are connected mutually from the top to bottom in sequence; and the driving magnetic field apparatus has mutual repulsive force on the elastic supporting apparatus, so that the elastic supporting apparatus can support a suspension frame used for placing a workpiece table. The supporting force is adjusted by using magnetic field force and the elastic apparatus, so that degree of freedom in a vertical direction is ensured; and the vibration absorption part which can adsorb base vibration is also provided, so that the supporting surface type of the workpiece table can be compensated while base vibration is not introduced. The invention also provides the photoetching machine equipment equipped with the auxiliary supporting apparatus. The photoetching machine equipment comprises the workpiece table, the suspension frame used for placing the workpiece table, and also comprises n auxiliary supporting apparatuses, wherein n is positive integer; and by adoption of the multiple auxiliary supporting apparatuses, the supporting force can be adjusted according to surface type change of the location, so that the supporting surface type of the workpiece table can be well compensated.

Description

technical field

[0001] The invention relates to the field of semiconductor lithography machines, in particular to an auxiliary support device and lithography machine equipment with auxiliary supports. Background technique

[0002] During the working process of the lithography machine system, the workpiece table and the mask table are respectively based on the two sides and one axis (object plane, focal plane and optical axis) of the exposure system. Driven by the control system, the workpiece table and the mask table are realized according to the required precision. The relative position between the mask tables and the position of the two relative to the exposure system. For the lithography machine equipment supported by four shock absorbers and four legs, under the influence of its own gravity, processing error, integration error and dynamic deformation of the workpiece table, the surface of the workpiece table support part will be concave and deformed, thus affecting the ...

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