Photoelectric conversion element and method for manufacturing photoelectric conversion element
A technology for photoelectric conversion elements and manufacturing methods, which is applied to electrical elements, photovoltaic power generation, electrolytic capacitors, etc., can solve the problems of difficulty in forming semiconductor porous films, increased distance between electrodes, and decreased power generation efficiency, and achieve ease of manufacture and Effects of improving collection efficiency and power generation efficiency
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Embodiment 1
[0109] Hereinafter, although an Example demonstrates this invention in detail, this invention is not limited by the following description.
[0110] (Formation of the first electrode 7)
[0111] As the first substrate 2 on which the transparent conductive film 3 was formed, a PEN thin film having a surface resistance of 15Ω / □ in which ITO was formed on the surface of the first substrate 2 was prepared.
[0112] As the conduction material 5 , a mesh pattern of silver electrodes (film thickness 5 μm, line width 100 μm) was formed on an ITO film by the screen printing method, and baked at 120° C. for 10 minutes. At this time, the opening size (mesh 1 mas size) of each mesh was set to 1100 μm×1100 μm.
[0113] (Formation of protective film 4)
[0114] On the first electrode 7, a screen printing method was used to form a mesh pattern of the protective film 4 (film thickness 10 μm, line width 20 μm) using an acrylic UV curable resin, and irradiated at 3000 mJ / cm 2 UV. At this tim...
Embodiment 2
[0125] In the formation of the first electrode 7, in addition to changing the line width of the silver electrode to 1000 μm, changing the opening size of each mesh to 6000 μm×6000 μm and changing the line width of the protective film 4 to 3000 μm in the formation of the protective film 4, Except changing the opening size of each mesh to 4000 micrometers x 4000 micrometers, it produced and evaluated similarly to the said Example 1.
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