A cutting method for super-large silicon wafers
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 江苏美科太阳能科技股份有限公司
- Publication Date
- 2019-03-22
Abstract
Description
technical field
[0001] The invention designs a method for cutting a silicon chip, and in particular relates to a method for cutting a super-sized silicon chip. Background technique
[0002] Silicon wafer is one of the most important basic materials in the microelectronics industry, and it is used in many researches. The existing method of cutting silicon wafers is to use tools such as glass knives and auxiliary tools such as rulers directly in the cutting process. Draw a line on the silicon wafer, and then cut the silicon wafer. However, due to the uneven force of the operator, the silicon wafer is often not cut well. First, the material is wasted, and second, there are often scratches on the cut silicon wafer. It is easy to affect the effect of use. Contents of the invention
[0003] The technical problem to be solved by the present invention is to propose a method for cutting super-large silicon wafers, which is simple and easy, and can cut super-large silicon wafers. ...