A device and method for continuous coating of nanoparticles by spatial atomic layer deposition

Abstract

A nanoparticle continuous-coating device based on spatial atomic layer deposition. A first-stage pipeline unit, a second-stage pipeline unit, a third-stage pipeline unit and a fourth-stage pipeline unit which are connected sequentially. The first-stage pipeline unit is used for providing a first precursor and enabling the first precursor to be adsorbed on surfaces of nanoparticles. The third-stage pipeline unit is used for providing a second precursor and enabling the second precursor to react with the first precursor on the surfaces of the nanoparticles, so that a monomolecular thin film layer is generated on the surfaces of the nanoparticles. The second-stage and fourth-stage pipeline units are used for cleaning the nanoparticles and discharging the redundant first precursor, the redundant second precursor or reaction by-products.

Description

technical field [0001] The invention belongs to the technical field of atomic layer deposition, and in particular relates to a continuous coating device and method for atomic layer deposition of nanoparticles in space. Background technique [0002] Powder particles have a series of excellent chemical and physical properties at the microscopic level, but at the same time, they also show disadvantages such as easy agglomeration, oxidation and unstable properties. By coating the surface of the powder particles with a protective film, the above shortcomings can be effectively overcome, and the powder particles with a protective film can also be used as a new composite material with excellent performance. [0003] At present, the coating methods of powder particles mainly include solid-phase method, liquid-phase method and gas-phase method. As a special chemical vapor deposition technology, atomic layer deposition technology has excellent uniformity and reliability compared with ...

AI Technical Summary

Problems solved by technology

[0005] (1) Only single-layer coating of nanoparticles can be achieved, and the deposition efficiency is low;

[0006] (2) The size of the device is too long, the processing of the pipeline is difficult, and the cleaning of the tube wall after the reaction is difficult;

[0007] (3) The precursor isolation problem in the coating process is not considered, and pollution will occur

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