Leveling device and leveling method of photoetching machine projection objective

A technology of projection objective lens and leveling device, applied in the field of lithography, can solve problems such as poor adjustment effect and small adjustment range, and achieve the effects of reducing response, improving detection performance, and suppressing low-frequency vibration
CN107290933AActive Publication Date: 2017-10-24SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Publication Date
2017-10-24

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Abstract

The invention discloses a leveling device and leveling method of a photoetching machine projection objective. The leveling device comprises a workbench, a hanging frame, a hanging frame support, an installation base plate, an objective frame, a photoelectric measurement system, a projection objective, a sensor measurement system, an active damper, a vertical adjustment mechanism and a controller, wherein the hanging frame is used for supporting the workbench, the hanging frame support is used for supporting the hanging frame, the installation base plate is arranged above the hanging frame support, the objective frame is arranged on the installation base plate, the photoelectric measurement system and the projection objective are arranged on the objective frame, the sensor measurement system is connected with a surface of the objective frame, the active damper is arranged on the installation base plate and is connected with the objective frame, the vertical adjustment mechanism is arranged below the active damper, and the controller is electrically connected with the sensor measurement system, the active damper and the vertical adjustment mechanism. By the leveling device, the purpose that the projection objective and the photoelectric measurement system are free from influence of external vibration and impact is achieved, meanwhile, the projection objective and the photoelectric measurement system are maintained in a static state relative to the position of the hanging frame of a support workpiece table all the way, the exposure imaging quality of the projection objective and the detection performance of the photoelectric measurement system are improved.
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Description

technical field

[0001] The invention relates to the technical field of lithography, in particular to a leveling device and a leveling method for a projection objective lens of a lithography machine. Background technique

[0002] In today's information society, the rapid development of display technology makes it play an increasingly important role in people's lives. At the same time, people's requirements for displays are getting higher and higher. The latest OLED (Organic Light-Emitting Diode, organic light-emitting display) has the advantages of ultra-thin, active light-emitting, high brightness, high contrast, wide viewing angle, wide operating temperature range, low power consumption, low cost, and all solid-state, etc. People provide more ideal display screens, and have a huge impact on the existing display industry structure, and are also considered to be the most powerful competitor of LCD (Liquid Crystal Display, liquid crystal display). The production of OLED depe...

Claims

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